EP 0000082 B1 19820721 - PROCESS FOR IMAGE-WISE MODIFYING THE SURFACE OF AN ETCHABLE SUPPORT AND MATERIAL SUITABLE THEREFOR COMPRISING A COLLOID LAYER CONTAINING POLYMERS WITH OXIME-ESTER GROUPS
Title (en)
PROCESS FOR IMAGE-WISE MODIFYING THE SURFACE OF AN ETCHABLE SUPPORT AND MATERIAL SUITABLE THEREFOR COMPRISING A COLLOID LAYER CONTAINING POLYMERS WITH OXIME-ESTER GROUPS
Publication
Application
Priority
GB 2320377 A 19770601
Abstract (en)
[origin: US4202697A] A radiation-sensitive material is described that comprises a hydrophilic colloid layer containing a dispersed phase of at least one radiation sensitive polymer the polymer chain of which comprises units with side substituents containing oxime ester groups. Upon imagewise exposure to actinic radiation the polymer in the exposed areas reduces the permeability of the hydrophilic colloid layer for an etchant in the absence of any ethylenically unsaturated monomer. The layer having upon image-wise exposure to radiation image-wise differentiations in permeability for an etchant can be used as etch-resist, without needing a washing away step, to modify image-wise the surface of an element e.g. to produce printed circuits or printing forms.
IPC 1-7
IPC 8 full level
G03F 7/26 (2006.01); C08F 20/00 (2006.01); C08F 20/34 (2006.01); C08F 20/52 (2006.01); G03F 7/038 (2006.01)
CPC (source: EP US)
G03F 7/0388 (2013.01 - EP US)
Designated contracting state (EPC)
BE DE GB
DOCDB simple family (publication)
EP 0000082 A1 19781220; EP 0000082 B1 19820721; DE 2861959 D1 19820909; FR 2393345 A1 19781229; FR 2393345 B1 19800425; JP S53149330 A 19781226; US 4202697 A 19800513
DOCDB simple family (application)
EP 78200022 A 19780601; DE 2861959 T 19780601; FR 7727557 A 19770909; JP 6483778 A 19780529; US 91033378 A 19780530