EP 0000702 B1 19811007 - PROCESS FOR FORMING A FLOW-RESISTANT RESIST MASK OF RADIOATION-SENSITIVE MATERIAL
Title (en)
PROCESS FOR FORMING A FLOW-RESISTANT RESIST MASK OF RADIOATION-SENSITIVE MATERIAL
Publication
Application
Priority
US 82246877 A 19770808
Abstract (en)
[origin: US4125650A] Resist images are hardened so that they are flow resistant at elevated temperatures by coating the image with a layer of a quinone-diazide hardening agent and heating the image to cause the agent to react with the resist and form a hardened image.
IPC 1-7
IPC 8 full level
G03F 7/00 (2006.01); G03F 7/40 (2006.01); H01L 21/027 (2006.01)
CPC (source: EP US)
G03F 7/40 (2013.01 - EP US)
Designated contracting state (EPC)
DE FR GB
DOCDB simple family (publication)
US 4125650 A 19781114; DE 2861132 D1 19811217; EP 0000702 A1 19790221; EP 0000702 B1 19811007; JP S5429574 A 19790305; JP S5649452 B2 19811121
DOCDB simple family (application)
US 82246877 A 19770808; DE 2861132 T 19780710; EP 78100337 A 19780710; JP 8217678 A 19780707