Global Patent Index - EP 0000843 A1

EP 0000843 A1 19790221 - Plasma discharge ion source.

Title (en)

Plasma discharge ion source.

Title (de)

Entladungs-Plasmaionenquelle.

Title (fr)

Source d'ions à décharge de plasma.

Publication

EP 0000843 A1 19790221 (EN)

Application

EP 78300268 A 19780808

Priority

US 82286677 A 19770808

Abstract (en)

It has been found that the proportions of the various ions produced by a plasma discharge source depends on the temperature of the plasma. In this invention means are provided increasing the temperature of the plasma. This is achieved by an arrangement (18, 34) which provides a containing field 32 which restrains the passage of electrons from the plasma to the anode (12), both radially outwards and axially to the end walls (30).

IPC 1-7

H01J 27/00; H01J 3/04

IPC 8 full level

H01J 37/08 (2006.01); H01J 27/08 (2006.01); H01J 27/14 (2006.01); H01L 21/265 (2006.01)

CPC (source: EP US)

H01J 27/14 (2013.01 - EP US)

Citation (search report)

  • GB 1414626 A 19751119 - FRANKS J
  • US 3025429 A 19620313 - DONALD GOW JAMES, et al
  • FR 1346091 A 19631213 - ASS ELECT IND
  • FR 1598559 A 19700706
  • FR 1459469 A 19660429 - ATOMIC ENERGY COMMISSION
  • NUCLEAR INSTRUMENTS AND METHODS, vol. 139, December 1976, Amsterdam. H. HINKEL: "Evaluation of electron trajectories in an arc discharge", pages 1-6
  • IEEE TRANSACTIONS ON NUCLEAR SCIENCE, vol. NS-19, no. 2, April 1972, New York, International conference on multiply-charged heavy ion sources and accelerating systems, held at riverside motor lodge, October 25-28, 1971. Gatlinburg (US) I. ALEXEFF et al.: "Production of Highly Stripped Heavy ions in hotelectron Plasmas produced by an electron beam", pages 195-199

Designated contracting state (EPC)

BE DE FR GB NL SE

DOCDB simple family (publication)

EP 0000843 A1 19790221; EP 0000843 B1 19810311; CA 1102931 A 19810609; DE 2860523 D1 19810409; IT 1121501 B 19860402; IT 7826513 A0 19780804; JP S5429970 A 19790306; JP S6130372 B2 19860712; US 4139772 A 19790213

DOCDB simple family (application)

EP 78300268 A 19780808; CA 308683 A 19780803; DE 2860523 T 19780808; IT 2651378 A 19780804; JP 9588978 A 19780808; US 82286677 A 19770808