Global Patent Index - EP 0004064 B1

EP 0004064 B1 19820623 - APPARATUS IN AN ION MICROPROBE FOR CONCENTRATING THE PRIMARY ION BEAM

Title (en)

APPARATUS IN AN ION MICROPROBE FOR CONCENTRATING THE PRIMARY ION BEAM

Publication

EP 0004064 B1 19820623 (DE)

Application

EP 79100668 A 19790306

Priority

AT 162278 A 19780307

Abstract (en)

[origin: EP0004064A2] 1. Apparatus in an ion microprobe for concentrating the primary ion beam upon a defined area of a test-material, comprising in beam-direction a primary ion source (1), an electromagnetic sector lense (3), a mass selecting diaphragm (4), an electrostatic objective lense (10), and deflection electrodes (11) for deflecting the primary ion beam, said electrodes (11) being arranged before or after the objective lense (10), characterized in that in between of the sector lense (3) and the objective lense (10) two electrostatic condenser lenses (5 and 9) are arranged having different lateral magnification, and in that a diaphragm (6) is arranged in between of said condenser lenses (5 and 9).

IPC 1-7

H01J 37/252

IPC 8 full level

H01J 37/252 (2006.01)

CPC (source: EP)

H01J 37/252 (2013.01)

Designated contracting state (EPC)

DE FR GB

DOCDB simple family (publication)

EP 0004064 A2 19790919; EP 0004064 A3 19791003; EP 0004064 B1 19820623; AT 353519 B 19791126; AT A162278 A 19790415; DE 2963139 D1 19820812

DOCDB simple family (application)

EP 79100668 A 19790306; AT 162278 A 19780307; DE 2963139 T 19790306