Global Patent Index - EP 0007976 A1

EP 0007976 A1 19800220 - Lithographic resist and device processing utilizing same.

Title (en)

Lithographic resist and device processing utilizing same.

Title (de)

Photoresist und Artikel, Verfahren zur Herstellung.

Title (fr)

Photorésist et article, procédé l'utilisant.

Publication

EP 0007976 A1 19800220 (EN)

Application

EP 79101528 A 19790521

Priority

US 90787478 A 19780522

Abstract (en)

Copolymers of poly-alpha substituted acrylonitrile, e.g., methylacrylonitrile, manifest film forming properties, adhesion to usual substrates, sensitivity to actinic radiation, resolution, contrast, and other properties of significance for fine line lithographic use. Contemplated use includes fabrication of masks for manufacture of large scale integrated circuits. Stability to attack by ions and reactive chemicals, as well as thermal stability, are sufficient to permit use in direct processing of such circuits. Integrity of pattern features may be further assured by post-development treatment. Heating results in rearrangement to render the patterned resist more stable under a variety dry processing conditions.

IPC 1-7

G03C 1/72; G03F 7/10

IPC 8 full level

G03F 7/039 (2006.01); H01L 21/027 (2006.01)

CPC (source: EP)

G03F 7/039 (2013.01)

Citation (search report)

  • [X] FR 2299665 A1 19760827 - IBM [US]
  • [X] GB 780218 A 19570731 - DU PONT
  • DE 2227008 A1 19721228
  • [A] DE 2520775 A1 19760401 - HITACHI CHEMICAL CO LTD
  • I.B.M. TECHNICAL DISCLOSURE BULLETIN, Vol. 16, no. 9, February 1974 New York, USA E. GIPSTEIN et al.: "Sensitive positive electron-beam resists" page 3028. * page 3028 *
  • I.B.M. TECHNICAL DISCLOSURE BULLETIN, Vol. 16, No. 11, April 1974; New York, USA O.V. NEED: "Polymethyl Alpha Cyano-acrylate Homopolymers and Copolymers as high-speed positive Electron-beam resists" page 3745.
  • I.B.M. TECHNICAL DISCLOSURE BULLETIN, Vol. 17, No. 5, October 1974, New York, USA E.C. FREDERICHS et al.: "Positive resists with increased adhesion" page 1354.
  • [P] JAPANESE PATENTS REPORT SECTION Ch CHEMICAL, Vol. 78, No. 42, 17 November 1978 DERWENT, London (GB) "Electron sensitive polymeric material" page G4; & JP-B-53 038 193 (13.10.1978)

Designated contracting state (EPC)

BE CH DE FR GB IT NL SE

DOCDB simple family (publication)

EP 0007976 A1 19800220; AU 4719279 A 19791129; ES 480802 A1 19800116; JP S54153633 A 19791204

DOCDB simple family (application)

EP 79101528 A 19790521; AU 4719279 A 19790518; ES 480802 A 19790522; JP 6316779 A 19790522