EP 0028303 A3 19810805 - PLASMA AND ION SOURCE
Title (en)
PLASMA AND ION SOURCE
Publication
Application
Priority
DE 2944467 A 19791103
Abstract (en)
[origin: EP0028303A2] 1. Plasma and ion source generating in a limited volume on the basis of the electron cyclotron resonance a plasma by means of a magnetic field, the irradiation of microwaves and the supply of the gas to be ionized, with the use of a permanent magnet (1) provided with an axial bore (2) into which both the microwaves (3) and the gas (4) can be introduced.
IPC 1-7
IPC 8 full level
H01J 27/18 (2006.01); H05H 1/50 (2006.01)
CPC (source: EP)
H01J 27/18 (2013.01)
Citation (search report)
- JAPANESE JOURNAL OF APPLIED PHYSICS, Band 11, 1972, Seiten 1226-1227 Tokyo, JP. H. TAMAGAWA et al.: "A proposal on multiply charged ion source" * Figur 1, Seite 1226, rechte Spalte, Absatz 3 *
- IEEE TRANSACTIONS ON NUCLEAR SCIENCE, Band NS-26, Nr. 3, Juni 1979, Seiten 3680-3682 New York, U.S.A. V. BECHTOLD et al.: "An ECR-type light ion source for the Karlsruhe isochronous cyclotron" * Figuren 1,2; Seite 3681, linke Spalte, Absatz 1 *
- IEEE TRANSACTIONS ON NUCLEAR SCIENCE, Band NS-26, Nr. 2, April 1979, Seiten 2120-2127 New York, U.S.A. R. GELLER: "Electron cyclotron resonance (E.C.R.) multiply charged ion sources" * Figuren 5, 15 *
Designated contracting state (EPC)
DE FR GB NL
DOCDB simple family (publication)
EP 0028303 A2 19810513; EP 0028303 A3 19810805; EP 0028303 B1 19831207; DE 2944467 A1 19810514; DE 3065834 D1 19840112
DOCDB simple family (application)
EP 80105360 A 19800908; DE 2944467 A 19791103; DE 3065834 T 19800908