EP 0035529 A4 19820216 - DEVICE MANUFACTURE INVOLVING PATTERN DELINEATION IN THIN LAYERS.
Title (en)
DEVICE MANUFACTURE INVOLVING PATTERN DELINEATION IN THIN LAYERS.
Title (de)
VERFAHREN ZUR HERSTELLUNG EINER ANORDNUNG UNTER VERWENDUNG VON STREIFENMUSTERN IN DÜNNSCHICHTEN.
Title (fr)
FABRICATION D'UN DISPOSITIF COMPORTANT UNE TRACE DE MODELES DANS DES COUCHES FINES.
Publication
Application
Priority
US 7140879 A 19790830
Abstract (en)
[origin: WO8100646A1] Etch procedures are monitored electrically by initiation of current flow upon baring of conducting surface (19) to etching fluid (11). Procedures include photoresist development in which current flow is through the usual aqueous ionic developing solution. In an exemplary use, a specifically designed monitoring wafer (10) serves for detection of end point for a batch of wafers undergoing processing.
IPC 1-7
IPC 8 full level
H01L 21/306 (2006.01); G01N 17/02 (2006.01); G01R 31/302 (2006.01); G03F 7/30 (2006.01); H01L 21/311 (2006.01); H01L 21/66 (2006.01)
CPC (source: EP)
B24B 37/013 (2013.01); G01N 17/02 (2013.01); G01R 31/302 (2013.01); G03F 7/30 (2013.01); H01L 21/31133 (2013.01); H01L 22/26 (2013.01)
Designated contracting state (EPC)
DE FR GB
DOCDB simple family (publication)
WO 8100646 A1 19810305; EP 0035529 A1 19810916; EP 0035529 A4 19820216; JP S56501226 A 19810827
DOCDB simple family (application)
US 8000934 W 19800728; EP 80901737 A 19810309; JP 50204080 A 19800728