Global Patent Index - EP 0084816 B2

EP 0084816 B2 19911030 - ELECTROLYTE FOR GALVANIC DEPOSITION OF ALUMINIUM

Title (en)

ELECTROLYTE FOR GALVANIC DEPOSITION OF ALUMINIUM

Publication

EP 0084816 B2 19911030 (DE)

Application

EP 83100245 A 19830113

Priority

DE 3202265 A 19820125

Abstract (en)

[origin: US4417954A] An organometallic electrolyte for the electrodeposition of aluminum is described which exhibits high throwing power as well as high conductivity and good solubility and is commercially readily accessible. For this purpose, the invention provides an electrolyte of a formula based upon an organometallic complex of potassium, rubidium or cesium fluoride in combination with a series of organometallic aluminum compounds.

IPC 1-7

C25D 3/44

IPC 8 full level

C25D 3/44 (2006.01); C25D 3/66 (2006.01)

CPC (source: EP US)

C25D 3/44 (2013.01 - EP US)

Designated contracting state (EPC)

AT BE CH DE FR GB IT LI LU NL SE

DOCDB simple family (publication)

EP 0084816 A2 19830803; EP 0084816 A3 19840606; EP 0084816 B1 19860604; EP 0084816 B2 19911030; AT E20252 T1 19860615; CA 1209157 A 19860805; DE 3202265 A1 19830728; DE 3363841 D1 19860710; DK 154657 B 19881205; DK 154657 C 19890501; DK 25183 A 19830726; DK 25183 D0 19830124; ES 519248 A0 19840316; ES 8403490 A1 19840316; JP S58171591 A 19831008; JP S6122038 B2 19860529; US 4417954 A 19831129

DOCDB simple family (application)

EP 83100245 A 19830113; AT 83100245 T 19830113; CA 420127 A 19830124; DE 3202265 A 19820125; DE 3363841 T 19830113; DK 25183 A 19830124; ES 519248 A 19830125; JP 655183 A 19830118; US 46081783 A 19830125