EP 0089405 B1 19860820 - TERPOLYMER RESIST COMPOSITION
Title (en)
TERPOLYMER RESIST COMPOSITION
Publication
Application
Priority
US 36071082 A 19820322
Abstract (en)
[origin: US4398001A] A resist sensitive to electron beam (and X-ray) radiation but resistant to reactive ion etching is formulated from a novolac resin and a sensitizer which is a terpolymer of sulfur dioxide, an olefin is hydrocarbon and an unsaturated ether.
IPC 1-7
IPC 8 full level
G03F 7/26 (2006.01); C08L 61/00 (2006.01); C08L 61/04 (2006.01); C08L 61/06 (2006.01); C08L 61/10 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01)
CPC (source: EP US)
G03F 7/039 (2013.01 - EP US)
Designated contracting state (EPC)
DE FR GB
DOCDB simple family (publication)
US 4398001 A 19830809; DE 3272761 D1 19860925; EP 0089405 A2 19830928; EP 0089405 A3 19840509; EP 0089405 B1 19860820; JP H0143941 B2 19890925; JP S58184143 A 19831027
DOCDB simple family (application)
US 36071082 A 19820322; DE 3272761 T 19821110; EP 82110351 A 19821110; JP 4460783 A 19830318