Global Patent Index - EP 0102874 B1

EP 0102874 B1 19861203 - NICKEL OR COBALT CHEMICAL PLATING BATH USING REDUCING AGENTS CONTAINING BORON OR PHOSPHOR

Title (en)

NICKEL OR COBALT CHEMICAL PLATING BATH USING REDUCING AGENTS CONTAINING BORON OR PHOSPHOR

Publication

EP 0102874 B1 19861203 (FR)

Application

EP 83401550 A 19830727

Priority

FR 8213431 A 19820730

Abstract (en)

[origin: US4486233A] A nickel and/or cobalt chemical plating bath comprises: a salt of the metal(s) to be deposited; one or more complexing agents of said metal(s), a reducing agent based on boron or phosphorous; and a stabilizing agent. To avoid including sources of corrosion and/or toxic substances in the plating, the stabilizing agent comprises a water soluble organic compound which possesses a readily accessible electron pair, and which does not include any metal or metalloid from group IIIa (other than boron or aluminum), IVa (other than carbon), Va (other than nitrogen or phosphorous), VIa (other than oxygen), or VIIa (other than fluorine or chlorine).

IPC 1-7

C23C 18/34

IPC 8 full level

C23C 18/34 (2006.01)

CPC (source: EP US)

C23C 18/34 (2013.01 - EP US)

Citation (examination)

EP 0066656 A1 19821215 - ASAHI GLASS CO LTD [JP]

Designated contracting state (EPC)

DE GB IT

DOCDB simple family (publication)

FR 2531103 A1 19840203; FR 2531103 B1 19851122; DE 3368088 D1 19870115; EP 0102874 A1 19840314; EP 0102874 B1 19861203; JP S5943857 A 19840312; US 4486233 A 19841204

DOCDB simple family (application)

FR 8213431 A 19820730; DE 3368088 T 19830727; EP 83401550 A 19830727; JP 13792283 A 19830729; US 51843183 A 19830729