EP 0137911 B1 19880727 - PROCESS FOR MANUFACTURING A DEPASSIVATING LAYER AND DEPASSIVATING LAYER ON AN ELECTRODE FOR AN ELECTROCHEMICAL CELL
Title (en)
PROCESS FOR MANUFACTURING A DEPASSIVATING LAYER AND DEPASSIVATING LAYER ON AN ELECTRODE FOR AN ELECTROCHEMICAL CELL
Publication
Application
Priority
CH 353183 A 19830628
Abstract (en)
[origin: US4597846A] A depassivation layer is produced on an electrode for an electrochemical cell by applying one or more layers of a metal salt solution, containing the elements to be applied, to the substrate (1) which is to be coated and is in the form of a porous plate, by means of rolling an elastic roller (2) over the substrate, with the insertion of a solution carrier (3) in the form of felt or paper, and then drying the layer and subjecting it to a chemical/thermal treatment in air (heat treatment at 450 DEG C.). Good depassivation layers with a relatively small noble metal content can be produced in this way. The depassivation layer which, in the form of a homogeneous film, is at least partially coherent contains, as a finely divided, sub-microscopic mixture, electronically conductive sub-oxides/oxides of the substrate (1) in addition to noble metals/noble metal oxides, and it can also contain further components, such as SnO2.
IPC 1-7
IPC 8 full level
C25B 11/03 (2006.01); B05D 1/28 (2006.01); C25B 11/00 (2006.01); C25B 11/04 (2006.01); C25B 11/10 (2006.01); H01M 4/66 (2006.01)
CPC (source: EP US)
B05D 1/28 (2013.01 - EP US); C25B 11/00 (2013.01 - EP US); C25B 11/093 (2021.01 - EP US)
Designated contracting state (EPC)
CH DE FR GB IT LI
DOCDB simple family (publication)
EP 0137911 A1 19850424; EP 0137911 B1 19880727; DE 3472979 D1 19880901; JP S6024389 A 19850207; US 4597846 A 19860701
DOCDB simple family (application)
EP 84107073 A 19840620; DE 3472979 T 19840620; JP 13216784 A 19840628; US 62523284 A 19840627