EP 0155547 B1 19881207 - PROCESS FOR THE ZINC-CALCIUM PHOSPHATIZING OF METAL SURFACES AT A LOW TREATING TEMPERATURE
Title (en)
PROCESS FOR THE ZINC-CALCIUM PHOSPHATIZING OF METAL SURFACES AT A LOW TREATING TEMPERATURE
Publication
Application
Priority
DE 3407513 A 19840301
Abstract (en)
[origin: ES8602963A1] Metal surfaces are phosphated with an acidic phosphating soln. contg. Zn, Ca, phosphate and accelerator and opt. Ni or fluoride. The metal surface, cleaned by degreasing, is contacted, without activation, at 30-65 (48-57) deg. C. with solns. contg. (a) over 0.5-1.5 g/l Ca ions, (b) 0.5-1.5 g/l An ions, (c) 10-50 g/l PO4 ions, and, as accelerator, (d) 0.5-30 g/l NO3 ions and/or 0.01-0.6 g/l NO2 ions and/or 0.2-10 g/l ClO3 ions and/or 0.1-2 g/l organic nitro cpd. and/or 0.01-0.5 g/l inorganic peroxide, esp. H2O2. - The solns. have pH 2.2-3.8. The molar ratio of free acid to total acid is 1 : 10 to 1 : 60 Wt. ratio (Ca ions + Zn ions) :PO4 ions is 1 : over 8 to 1 : 40.
[origin: ES8602963A1] Metal surfaces are phosphated with an acidic phosphating soln. contg. Zn, Ca, phosphate and accelerator and opt. Ni or fluoride. The metal surface, cleaned by degreasing, is contacted, without activation, at 30-65 (48-57) deg. C. with solns. contg. (a) over 0.5-1.5 g/l Ca ions, (b) 0.5-1.5 g/l An ions, (c) 10-50 g/l PO4 ions, and, as accelerator, (d) 0.5-30 g/l NO3 ions and/or 0.01-0.6 g/l NO2 ions and/or 0.2-10 g/l ClO3 ions and/or 0.1-2 g/l organic nitro cpd. and/or 0.01-0.5 g/l inorganic peroxide, esp. H2O2. - The solns. have pH 2.2-3.8. The molar ratio of free acid to total acid is 1 : 10 to 1 : 60 Wt. ratio (Ca ions + Zn ions) :PO4 ions is 1 : over 8 to 1 : 40.
IPC 1-7
C23C 22/22; C23C 22/12; C23C 22/13; C23C 22/14; C23C 22/16; C23C 22/17
IPC 8 full level
C23C 22/12 (2006.01); C23C 22/13 (2006.01); C23C 22/14 (2006.01); C23C 22/16 (2006.01); C23C 22/17 (2006.01); C23C 22/22 (2006.01); C23C 22/36 (2006.01)
CPC (source: EP US)
C23C 22/22 (2013.01 - EP US); C23C 22/36 (2013.01 - EP US); C23C 22/367 (2013.01 - EP US)
Citation (examination)
- DE 1521818 A1 19691016 - LUBRIZOL CORP
- PATENT ABSTRACTS OF JAPAN, unexamined applications, C field vol. 4, no. 98, July 15,1980, THE PATENT OFFICE JAPANESE GOVERNMENT, page 8 C 18
Designated contracting state (EPC)
AT BE DE FR GB IT NL SE
DOCDB simple family (publication)
EP 0155547 A1 19850925; EP 0155547 B1 19881207; AT E39135 T1 19881215; CA 1245951 A 19881206; DE 3407513 A1 19850905; DE 3566683 D1 19890112; ES 540769 A0 19851201; ES 8602963 A1 19851201; JP S60208479 A 19851021; US 4622078 A 19861111; ZA 851550 B 19851030
DOCDB simple family (application)
EP 85102057 A 19850225; AT 85102057 T 19850225; CA 474932 A 19850222; DE 3407513 A 19840301; DE 3566683 T 19850225; ES 540769 A 19850228; JP 4176885 A 19850301; US 70325185 A 19850220; ZA 851550 A 19850228