Global Patent Index - EP 0174977 A4

EP 0174977 A4 19870212 - CONTROLLED VACUUM ARC MATERIAL DEPOSITION, METHOD AND APPARATUS.

Title (en)

CONTROLLED VACUUM ARC MATERIAL DEPOSITION, METHOD AND APPARATUS.

Title (de)

VERFAHREN UND VORRICHTUNG ZUM GESTEUERTEN AUFBRINGEN VON MATERIAL MITTELS LICHTBOGEN IM VAKUUM.

Title (fr)

DEPOSITION REGULEE DE MATERIAU PAR ARC SOUS VIDE, PROCEDE ET APPAREIL.

Publication

EP 0174977 A4 19870212 (EN)

Application

EP 85901674 A 19850227

Priority

US 58584584 A 19840302

Abstract (en)

[origin: WO8503954A1] A method and apparatus for vacuum arc deposition of material on a surface of an object (32), uses a vacuum chamber (12) accomodating the active surface of the cathode (24) and an anode (34). A power supply connected to the anode (34) and cathode (24) establishes an electric arc. The track of the arc is controlled with a magnetic field established with a permanent magnet (56) that is moved in a closed path relative to the cathode. A solenoid (68) modifies the main magnetic field produced on the active surface of the cathode (24).

IPC 1-7

C23C 13/12; C23C 15/00

IPC 8 full level

C23C 14/24 (2006.01); C23C 14/32 (2006.01); H01J 37/32 (2006.01)

CPC (source: EP)

C23C 14/325 (2013.01); H01J 37/32055 (2013.01); H01J 37/32623 (2013.01); H01J 37/3266 (2013.01)

Citation (search report)

  • [X] SOVIET INVENTIONS ILLUSTRATED, week D15, 20th May 1981; & SU-A-711 787 (L.P. SABLEV) 17-06-1978
  • See references of WO 8503954A1

Designated contracting state (EPC)

AT BE CH DE FR GB LI LU NL SE

DOCDB simple family (publication)

WO 8503954 A1 19850912; CA 1247043 A 19881220; EP 0174977 A1 19860326; EP 0174977 A4 19870212; JP H0548298 B2 19930721; JP S61501328 A 19860703

DOCDB simple family (application)

US 8500312 W 19850227; CA 475374 A 19850228; EP 85901674 A 19850227; JP 50113685 A 19850227