EP 0192310 B1 19900822 - METHOD OF CONTINUOUSLY REGENERATING AN ELECTROLESS-PLATING BATH AND DEVICE FOR CARRYING OUT THE METHOD
Title (en)
METHOD OF CONTINUOUSLY REGENERATING AN ELECTROLESS-PLATING BATH AND DEVICE FOR CARRYING OUT THE METHOD
Publication
Application
Priority
NL 8500474 A 19850220
Abstract (en)
[origin: EP0192310A1] An electroless plating bath is continuously regenerated by means of reverse osmosis and selective membranes are used which yield a high retention of metal complexes, complexing agents and surfactants and a low retention of the monovalent anions to be removed, for example, nitrate, formiate anions and bicarbonate anions in the case of a copper-plating bath.
IPC 1-7
IPC 8 full level
C23C 18/31 (2006.01); C23C 18/16 (2006.01)
CPC (source: EP)
C23C 18/1617 (2013.01)
Citation (examination)
DE 3022962 A1 19810212 - HITACHI LTD
Designated contracting state (EPC)
DE FR GB NL
DOCDB simple family (publication)
EP 0192310 A1 19860827; EP 0192310 B1 19900822; DE 3673536 D1 19900927; JP S61194182 A 19860828; NL 8500474 A 19860916
DOCDB simple family (application)
EP 86200247 A 19860219; DE 3673536 T 19860219; JP 3101186 A 19860217; NL 8500474 A 19850220