EP 0198908 A4 19870302 - FOCUSED SUBSTRATE ALTERATION.
Title (en)
FOCUSED SUBSTRATE ALTERATION.
Title (de)
VERÄNDERUNG EINES SUBSTRATS DURCH EINEN FOKUSSIERTEN STRAHL.
Title (fr)
ALTERATION FOCALISEE D'UN SUBSTRAT.
Publication
Application
Priority
- US 66525184 A 19841026
- US 76937085 A 19850826
Abstract (en)
[origin: WO8602774A1] Alteration of a precisely located site on a substrate (35) using apparatus that comprises: a) a focusable ion source (10); b) a lens (22) positioned to focus ions emitted by the source into an ion beam (124); c) a vacuum chamber (30) for containing the substrate site in the path of the ion beam; and d) a directed gas inlet (55) positioned to provide a localized supply of a substance at the site whereby the beam interacts with the substances to cause the alteration localized at the site. Methods of performing the alteration are also disclosed.
IPC 1-7
IPC 8 full level
G03F 1/00 (2006.01); H01J 37/317 (2006.01)
CPC (source: EP)
G03F 1/74 (2013.01); H01J 37/3178 (2013.01)
Citation (search report)
- [A] EP 0075949 A2 19830406 - HITACHI LTD [JP]
- See references of WO 8602774A1
Designated contracting state (EPC)
AT BE CH DE FR GB IT LI LU NL SE
DOCDB simple family (publication)
WO 8602774 A1 19860509; EP 0198907 A1 19861029; EP 0198908 A1 19861029; EP 0198908 A4 19870302; WO 8602581 A1 19860509
DOCDB simple family (application)
US 8502109 W 19851025; EP 85905574 A 19851025; EP 85905575 A 19851025; US 8502108 W 19851025