Global Patent Index - EP 0211168 B1

EP 0211168 B1 19890104 - METHOD OF PRODUCING A TRANSPARENT PHOTOCATHODE

Title (en)

METHOD OF PRODUCING A TRANSPARENT PHOTOCATHODE

Publication

EP 0211168 B1 19890104 (DE)

Application

EP 86107082 A 19860524

Priority

DE 3524765 A 19850711

Abstract (en)

[origin: US4713353A] A method of producing a transparent photocathode comprises applying a multi-layer wafer to a carrier service so that the wafer projects beyond the carrier on all sides, effecting a chemical denudation on the substrate and after the chemical denudation on the substrate removing at least the overhanging parts of the multi-layer wafer mechanically. Chemical denudations are advantageously made by etching. The substrate comprises a gallium arsenide. The subsequent layers in the active photocathode semiconductor layer are applied by an epitaxial process.

IPC 1-7

H01J 9/12; H01L 21/302

IPC 8 full level

H01J 9/12 (2006.01); H01J 29/38 (2006.01); H01L 21/302 (2006.01)

CPC (source: EP US)

H01J 9/12 (2013.01 - EP US); H01J 29/38 (2013.01 - EP US); H01J 2201/3423 (2013.01 - EP US)

Designated contracting state (EPC)

DE FR GB NL

DOCDB simple family (publication)

DE 3524765 A1 19870122; DE 3661666 D1 19890209; EP 0211168 A1 19870225; EP 0211168 B1 19890104; US 4713353 A 19871215

DOCDB simple family (application)

DE 3524765 A 19850711; DE 3661666 T 19860524; EP 86107082 A 19860524; US 88196786 A 19860703