EP 0237668 B1 19900613 - PROCESS AND APPARATUS FOR APPLYING CHILLED ELECTROSTATICALLY CHARGED PARTICLES TO THE SURFACE OF A LARGE METAL ARTICLE
Title (en)
PROCESS AND APPARATUS FOR APPLYING CHILLED ELECTROSTATICALLY CHARGED PARTICLES TO THE SURFACE OF A LARGE METAL ARTICLE
Publication
Application
Priority
US 82180286 A 19860123
Abstract (en)
[origin: EP0237668A1] The process described herein comprises the application of chilled particles such as polytetrafluoroethylene generally marketed under the trade mark "TEFLON", graphite, molybdenum sulfite, boron nitride, etc., to a metal surface having crevices or pores therein. With the metal heated to expand the crevices or pores and the particles chilled to contract them, the particles will be locked into the pores when both the metal and the particles come to equilibrium temperature with the particles thereby expanding and the pores contracting. The process described herein is directed to such an application of chilled particles to expanded pores in large metal objects such as for example, large rolls (1). The large object is rotated on its linear axis (2) while maintained at the desired raised temperature and the particles are given an electrostatic charge and chilled prior to their application to the metal surface. Apparatus for effecting this application of electrostatically charged chilled particles is also described.
IPC 1-7
IPC 8 full level
B05D 1/04 (2006.01); B05B 5/03 (2006.01); B05B 5/08 (2006.01); B05D 1/06 (2006.01); B05D 3/00 (2006.01); B05D 5/08 (2006.01); B22D 19/10 (2006.01); B22F 9/02 (2006.01); B23P 6/04 (2006.01); B05D 1/00 (2006.01); B05D 3/02 (2006.01)
CPC (source: EP)
B05B 5/001 (2013.01); B05B 5/032 (2013.01); B05B 5/082 (2013.01); B05D 5/083 (2013.01); B05D 1/002 (2013.01); B05D 1/06 (2013.01); B05D 3/0218 (2013.01); B05D 5/086 (2013.01)
Designated contracting state (EPC)
CH DE FR GB IT LI
DOCDB simple family (publication)
EP 0237668 A1 19870923; EP 0237668 B1 19900613; CA 1268672 A 19900508; CA 1268672 C 19900508; DE 3671847 D1 19900719; JP H0685896 B2 19941102; JP S62171762 A 19870728
DOCDB simple family (application)
EP 86304595 A 19860616; CA 510001 A 19860526; DE 3671847 T 19860616; JP 21083286 A 19860909