Global Patent Index - EP 0256820 A3

EP 0256820 A3 19890607 - THERMAL DEVELOPING LIGHT-SENSITIVE MATERIAL

Title (en)

THERMAL DEVELOPING LIGHT-SENSITIVE MATERIAL

Publication

EP 0256820 A3 19890607 (EN)

Application

EP 87307044 A 19870807

Priority

  • JP 18085687 A 19870720
  • JP 18708986 A 19860808

Abstract (en)

[origin: EP0256820A2] There is disclosed a thermal developing light-sensitive material comprising a support and, provided thereon, photographic structural layers comprising at least one layer containing light-sensitive silver halide, said photographic structural layer comprising a compound represented by general formula (1); Formula (1) X1 - L1 - A wherein X1 represents a residual group of a photographic restrainer, L1 is a mere bonding hand or a divalent group and A is selected from the group consisting of a hydrogen atom, an amino group, a hydroxyl group, a carboxyl group or a salt thereof, a sulfo group or a salt thereof and a sulfin group or a salt thereof; and a a compound represented by general formula (2); Formula (2) X2 - L2 - B wherein X2 represents a residual group of a photographic restrainer, L2 is a divalent group and B is a ballast group.

IPC 1-7

G03C 1/02

IPC 8 full level

G03C 1/498 (2006.01)

CPC (source: EP)

G03C 1/49845 (2013.01)

Citation (search report)

[XPL] EP 0218385 A2 19870415 - KONISHIROKU PHOTO IND [JP]

Designated contracting state (EPC)

DE FR GB IT NL

DOCDB simple family (publication)

EP 0256820 A2 19880224; EP 0256820 A3 19890607; EP 0256820 B1 19920729; DE 3780725 D1 19920903; DE 3780725 T2 19930318

DOCDB simple family (application)

EP 87307044 A 19870807; DE 3780725 T 19870807