Global Patent Index - EP 0292976 A2

EP 0292976 A2 19881130 - Scanning type projection exposure system.

Title (en)

Scanning type projection exposure system.

Title (de)

Belichtungssystem vom Abtastungstyp.

Title (fr)

Système de projection par balayage.

Publication

EP 0292976 A2 19881130 (EN)

Application

EP 88108440 A 19880526

Priority

  • JP 13051887 A 19870527
  • JP 16001387 A 19870626

Abstract (en)

A scanning type projection exposure system includes a source emitting light. The light is applied to a portion of a mask having a preset pattern. At least one optical erect projection sub-system images a portion of the pattern on a substrate. The portion of the pattern corresponds to the portion of the mask exposed to the light. The projection sub-system is subjected to scanning movement. The mask and the substrate are subjected to scanning movement. Relative positions of the mask and the substrate are held fixed during the scanning movement of the mask and the substrate.

IPC 1-7

G03B 41/00

IPC 8 full level

G03F 7/20 (2006.01)

CPC (source: EP KR US)

C03B 5/02 (2013.01 - KR); G03B 17/00 (2013.01 - KR); G03F 7/70075 (2013.01 - EP US); G03F 7/70358 (2013.01 - EP US); G03F 7/70366 (2013.01 - EP US)

Designated contracting state (EPC)

DE FR GB

DOCDB simple family (publication)

EP 0292976 A2 19881130; EP 0292976 A3 19891102; KR 880013829 A 19881222; KR 920002820 B1 19920404; US 4844568 A 19890704

DOCDB simple family (application)

EP 88108440 A 19880526; KR 880006108 A 19880525; US 19907888 A 19880526