EP 0297306 B1 19930120 - AQUEOUS ACID BATH FOR THE GALVANIC DEPOSITION OF BRIGHTENING AND LEVELING COPPER COATINGS
Title (en)
AQUEOUS ACID BATH FOR THE GALVANIC DEPOSITION OF BRIGHTENING AND LEVELING COPPER COATINGS
Publication
Application
Priority
DE 3721985 A 19870630
Abstract (en)
[origin: EP0297306A1] An aqueous acidic bath for the electrodeposition of bright and level copper coatings contains at least one benzothiazonium compound of the general formula <IMAGE> in which R1 is C1-C5-alkyl, optionally substituted aryl or aralkyl, R2 is hydrogen, C1-C5-alkyl or C1-C5-alkoxy, R3 and R4 are each C1-C5-alkyl and X is an acid radical.
IPC 1-7
IPC 8 full level
C25D 3/38 (2006.01)
CPC (source: EP)
C25D 3/38 (2013.01)
Designated contracting state (EPC)
BE CH DE ES FR GB IT LI LU NL SE
DOCDB simple family (publication)
EP 0297306 A1 19890104; EP 0297306 B1 19930120; AT 396946 B 19931227; AT A166488 A 19930515; DE 3721985 A1 19890112; DE 3877633 D1 19930304; ES 2045013 T3 19940116; JP H01100292 A 19890418
DOCDB simple family (application)
EP 88108876 A 19880603; AT 166488 A 19880627; DE 3721985 A 19870630; DE 3877633 T 19880603; ES 88108876 T 19880603; JP 16108988 A 19880630