EP 0301044 A4 19890329 - PHOTORESIST STRIPPER COMPOSITION.
Title (en)
PHOTORESIST STRIPPER COMPOSITION.
Title (de)
ÄTZZUSAMMENSETZUNG FÜR PHOTORESERVE.
Title (fr)
COMPOSITION SERVANT A ENLEVER DES PHOTORESERVES DE PROTECTION.
Publication
Application
Priority
US 1091387 A 19870205
Abstract (en)
[origin: WO8805813A1] A photoresist stripper composition comprises a mixture of (a) pyrrolidone, N-substituted pyrrolidones, butyrolactone or caprolactone as the major component and (b) from about 2 to about 10 percent by weight of a tetraalkylammonium hydroxide or a trialkylaralkylammonium hydroxide. Optional components of the mixture include surfactants, diluents and metal corrosion inhibitors. Extraneously added water is avoided. The compositions are efficient in stripping photoresists which, by reason of processing conditions, have become highly cross-linked and resistant to removal by solvents other than hot phenolic or halohydrocarbon strippers.
IPC 1-7
IPC 8 full level
C11D 7/06 (2006.01); C11D 7/50 (2006.01); G03F 7/42 (2006.01); C11D 7/26 (2006.01); C11D 7/32 (2006.01)
CPC (source: EP)
C11D 7/06 (2013.01); C11D 7/5013 (2013.01); C11D 7/263 (2013.01); C11D 7/267 (2013.01); C11D 7/3209 (2013.01); C11D 7/3281 (2013.01)
Citation (search report)
- [A] GB 2172304 A 19860917 - POLYPLASTICS CO
- [A] DE 3434128 A1 19860320 - LICENTIA GMBH [DE]
- See references of WO 8805813A1
Designated contracting state (EPC)
AT BE CH DE FR GB IT LI LU NL SE
DOCDB simple family (publication)
WO 8805813 A1 19880811; AU 1158288 A 19880824; EP 0301044 A1 19890201; EP 0301044 A4 19890329; JP H01502059 A 19890713; ZA 877008 B 19880323
DOCDB simple family (application)
US 8702291 W 19870910; AU 1158288 A 19870910; EP 88900899 A 19870910; JP 50106087 A 19870910; ZA 877008 A 19870917