Global Patent Index - EP 0317092 A1

EP 0317092 A1 19890524 - Catalyst for electroless plating process.

Title (en)

Catalyst for electroless plating process.

Title (de)

Katalysator für die stromlose Plattierung.

Title (fr)

Catalyseur pour dépÔt chimique.

Publication

EP 0317092 A1 19890524 (EN)

Application

EP 88310037 A 19881026

Priority

GB 8725148 A 19871027

Abstract (en)

Complexes comprising X palladium atoms and Y nitrogen-containing ligands wherein X/Y>=1 are useful as sensitisers in rendering substrates catalytic to the deposition of electroless metal. The compounds can be prepared by reacting A moles of a nitrogen-containing compound with B moles of palladium where A/B<=4 at a pH of 6 or above.

IPC 1-7

C23C 18/28

IPC 8 full level

C23C 18/28 (2006.01); C23C 18/30 (2006.01); C23C 18/38 (2006.01)

CPC (source: EP)

C23C 18/28 (2013.01)

Citation (search report)

  • [XD] EP 0167326 A2 19860108 - HITACHI CHEMICAL CO LTD [JP]
  • [X] FR 2132172 A1 19721117 - SCHERING AG
  • [A] FR 1481700 A 19670519 - PHOTOCIRCUITS CORP
  • [X] PATENT ABSTRACTS OF JAPAN, vol. 9, no. 166 (C-290)[1889], 11th July 1985; & JP-A-60 36 672 (HITACHI KASEI KOGYO K.K.) 25-02-1985
  • [X] METALLOBERFLÄCHE, vol. 31, no. 11, 1977, page 521; J. ANSCHÜTZ: "Aktivierung von elektrischen Nichtleitern mit palladiumhaltigen Katalysator-Lösungen"

Designated contracting state (EPC)

DE FR GB IT

DOCDB simple family (publication)

EP 0317092 A1 19890524; GB 8725148 D0 19871202; JP H01149971 A 19890613

DOCDB simple family (application)

EP 88310037 A 19881026; GB 8725148 A 19871027; JP 27191988 A 19881027