Global Patent Index - EP 0348608 B2

EP 0348608 B2 20001004 - Method of deposing silicon crystals

Title (en)

Method of deposing silicon crystals

Title (de)

Verfahren zum Freilegen von Silizium-Kristallen

Title (fr)

Procédé pour dégager des cristaux de silicium

Publication

EP 0348608 B2 20001004 (DE)

Application

EP 89105763 A 19890401

Priority

DE 3822169 A 19880630

Abstract (en)

[origin: EP0348608A1] A method is described of exposing silicon crystals on fine- machined, preferably honed surfaces of workpieces made from silicon alloys or from hypereutectic aluminium-silicon alloys such as Al Si 17 Cu 4 Mg, in which the silicon crystals (1) are embedded in a substantially softer matrix (2). To this end, the surface of the workpiece is treated with a brush (4 to 30) subsequently to the fine machining. <IMAGE>

IPC 1-7

B24D 13/10; B24B 33/02

IPC 8 full level

B24B 33/02 (2006.01); B24D 13/10 (2006.01)

CPC (source: EP)

B24B 33/02 (2013.01); B24D 13/10 (2013.01)

Citation (opposition)

Opponent :

Designated contracting state (EPC)

DE FR GB IT SE

DOCDB simple family (publication)

EP 0348608 A1 19900103; EP 0348608 B1 19920916; EP 0348608 B2 20001004; DE 3822169 A1 19900104; DE 3822169 C2 19930204; DE 58902276 D1 19921022

DOCDB simple family (application)

EP 89105763 A 19890401; DE 3822169 A 19880630; DE 58902276 T 19890401