EP 0360274 A3 19910417 - SILICON-CONTAINING POLYMER AND PHOTOSENSITIVE MATERIAL CONTAINING THE SAME
Title (en)
SILICON-CONTAINING POLYMER AND PHOTOSENSITIVE MATERIAL CONTAINING THE SAME
Publication
Application
Priority
JP 23629988 A 19880922
Abstract (en)
[origin: EP0360274A2] The subject matter of the invention is a silicon-containing polymer comprising repeating units of a silicon-containing cyclic compound, represented by a general formula (I) <CHEM> (wherein m, n and x are detined as in the patent claim), and a photosensitive material containing said silicon-containing polymer.
IPC 1-7
IPC 8 full level
C08G 77/06 (2006.01); C08G 77/24 (2006.01); C08G 77/26 (2006.01); G03F 7/075 (2006.01)
CPC (source: EP KR US)
C08G 77/06 (2013.01 - EP US); C08G 77/24 (2013.01 - EP US); C08G 77/26 (2013.01 - EP US); G03F 7/075 (2013.01 - KR); G03F 7/0757 (2013.01 - EP US)
Citation (search report)
- [A] US 4069178 A 19780117 - MIKAMI RYUZO, et al
- [A] EP 0164598 A2 19851218 - NIPPON TELEGRAPH & TELEPHONE [JP]
- [A] EP 0246169 A1 19871119 - RHONE POULENC MULTI TECH [FR]
- [A] PATENT ABSTRACTS OF JAPAN vol. 8, no. 254 (P-315)(1691), 21 November 1984; & JP - A - 59125730 (FUJITSU K.K.) 20.07.1984
- [A] PATENT ABSTRACTS OF JAPAN vol. 10, no. 132 (P-456)(2189), 16 May 1986; & JP - A - 60254034 (FUJITSU K.K.) 14.12.1985
Designated contracting state (EPC)
BE DE FR GB NL
DOCDB simple family (publication)
EP 0360274 A2 19900328; EP 0360274 A3 19910417; EP 0360274 B1 19940615; DE 68916143 D1 19940721; DE 68916143 T2 19940922; KR 900005224 A 19900413; KR 950000483 B1 19950120; US 5057396 A 19911015
DOCDB simple family (application)
EP 89117512 A 19890922; DE 68916143 T 19890922; KR 890013665 A 19890922; US 41057389 A 19890921