EP 0400578 A3 19910529 - METHOD AND APPARATUS FOR MAINTAINING DESIRED EXPOSURE LEVELS
Title (en)
METHOD AND APPARATUS FOR MAINTAINING DESIRED EXPOSURE LEVELS
Publication
Application
Priority
US 35980689 A 19890531
Abstract (en)
[origin: EP0400578A2] A radiation beam used for selectively exposing a surface is moved ina helical path by means of two oscillating mirros vibrating about axes that are mutually perpendicular. By maintaining a constant product fo oscillating frequency and rotational oscillatory mirror deflection, the level of exposure can be made substantially constant.
IPC 1-7
IPC 8 full level
G02B 26/10 (2006.01); G03C 9/08 (2006.01); G03F 7/00 (2006.01); G03F 7/20 (2006.01)
CPC (source: EP KR US)
G03B 7/00 (2013.01 - KR); G03F 7/0037 (2013.01 - EP US); G03F 7/70416 (2013.01 - EP US); Y10S 430/146 (2013.01 - EP US); Y10S 430/148 (2013.01 - EP US)
Citation (search report)
- [Y] EP 0171069 A2 19860212 - UVP INC [US]
- [Y] DE 2910516 A1 19800918 - KIRIN BREWERY
- [Y] FR 2612718 A1 19880923 - THOMSON CSF [FR]
- [A] EP 0206880 A1 19861230 - VIDEOCOLOR [FR]
- [A] US 4135902 A 19790123 - OEHRLE ROBERT C
- [A] US 4238840 A 19801209 - SWAINSON WYN K [US]
Designated contracting state (EPC)
CH DE DK FR GB IT LI NL SE
DOCDB simple family (publication)
EP 0400578 A2 19901205; EP 0400578 A3 19910529; EP 0400578 B1 19951213; AU 5615090 A 19901206; AU 641162 B2 19930916; CA 2016388 A1 19901130; CN 1047927 A 19901219; DE 69024100 D1 19960125; DE 69024100 T2 19960530; JP H03197951 A 19910829; KR 900018726 A 19901222; US 4987044 A 19910122
DOCDB simple family (application)
EP 90110167 A 19900529; AU 5615090 A 19900530; CA 2016388 A 19900509; CN 90103994 A 19900531; DE 69024100 T 19900529; JP 13866790 A 19900530; KR 900007868 A 19900530; US 35980689 A 19890531