EP 0423370 A4 19911121 - METHOD OF TREATMENT WITH PLASMA AND PLASMATRON
Title (en)
METHOD OF TREATMENT WITH PLASMA AND PLASMATRON
Publication
Application
Priority
- SU 4680291 A 19890331
- SU 4698232 A 19890418
Abstract (en)
[origin: WO9012123A1] A method of treatment with plasma provides for focusing a treating agent fed through an annular slot into a plasma jet, the focusing gas being fed into the confluence point of the jet with the transportation gas-flow carrying the treating component. In a plasmatron two nozzles (22, 23) are mounted after the output electrode (21). Between the output electrode (21) and the first nozzle (22) is provided an annular slot (24) for feeding a treating component, whereas between the nozzles (22, 23) is provided an annular slot (25) for feeding a focusing gas. The surfaces (26, 27) of the first nozzle (22) facing, respectively, the electrode (21) and the second nozzle (23) are oriented at an angle $g(d), whose vertex (28) is located between the outlet opening of the electrode (21) and the inlet opening of the second nozzle (23).
IPC 1-7
IPC 8 full level
H05H 1/42 (2006.01); C23C 4/12 (2006.01); H05B 7/18 (2006.01)
CPC (source: EP)
C23C 4/134 (2016.01)
Citation (search report)
- [A] EP 0250308 A1 19871223 - SNMI SOC NOUV METALL IND [FR]
- [A] EP 0202077 A1 19861120 - ONODA CEMENT CO LTD [JP]
- [A] DE 2155217 A1 19730510 - PHILIPS PATENTVERWALTUNG
- See references of WO 9012123A1
Designated contracting state (EPC)
AT CH DE FR GB IT LI SE
DOCDB simple family (publication)
WO 9012123 A1 19901018; AU 5449190 A 19901105; BR 9006280 A 19910806; EP 0423370 A1 19910424; EP 0423370 A4 19911121; FI 905886 A0 19901129; JP H03505104 A 19911107
DOCDB simple family (application)
SU 9000009 W 19900115; AU 5449190 A 19900115; BR 9006280 A 19900115; EP 90906434 A 19900115; FI 905886 A 19901129; JP 50639590 A 19900115