EP 0449639 A3 19920506 - BIASING SYSTEM FOR REDUCING ION LOSS IN LAMPS
Title (en)
BIASING SYSTEM FOR REDUCING ION LOSS IN LAMPS
Publication
Application
Priority
US 50088690 A 19900329
Abstract (en)
[origin: EP0449639A2] A high intensity discharge lamp system includes an AC supply for a chamber within which a plasma conductor is created to generate light. In order to confine charged particles within the chamber and to inhibit migration and loss thereof, a DC circuit taps power from the AC supply and produces a DC potential which is applied to relatively large-surface components in the vicinity of the plasma chamber. Properly polarized, the large-surface components, such as a reflector and a conductive housing, refractor or door, produces electric fields which inhibit migration of the charged particles. The result is improved color and light output as well as increased lamp life.
IPC 1-7
IPC 8 full level
F21V 3/04 (2006.01); H01J 61/10 (2006.01); H01J 61/24 (2006.01); H01J 61/56 (2006.01); H05B 41/19 (2006.01); H05B 41/231 (2006.01)
CPC (source: EP)
H01J 61/10 (2013.01); H01J 61/24 (2013.01); H05B 41/19 (2013.01)
Citation (search report)
- [X] GB 1227810 A 19710407
- [A] GB 2162683 A 19860205 - TUNGSRAM RESZVENYTARSASAG
- [A] FR 1413359 A 19651008 - ASS ELECT IND
- [A] DE 853186 C 19521023 - SIEMENS AG
- [AD] US 4763044 A 19880809 - NUCKOLLS JOE A [US], et al
- [A] PATENT ABSTRACTS OF JAPAN vol. 3, no. 154 (M-85)18 December 1979 & JP-A-54 132 368 ( MITSUBISHI DENKI K.K. ) 15 October 1979
- [A] PATENT ABSTRACTS OF JAPAN vol. 13, no. 544 (E-855)6 December 1989 & JP-A-1 225 098 ( TOSHIBA CORP ) 7 September 1989
Designated contracting state (EPC)
DE GB NL
DOCDB simple family (publication)
EP 0449639 A2 19911002; EP 0449639 A3 19920506; EP 0449639 B1 19961113; CA 2037886 A1 19910930; DE 69123071 D1 19961219; JP 2978268 B2 19991115; JP H04223095 A 19920812
DOCDB simple family (application)
EP 91302776 A 19910328; CA 2037886 A 19910308; DE 69123071 T 19910328; JP 9125891 A 19910329