EP 0451943 A2 19911016 - Plasma processing method and apparatus.
Title (en)
Plasma processing method and apparatus.
Title (de)
Verfahren und Gerät zur Plasmabearbeitung.
Title (fr)
Méthode et appareil de traitement par plasma.
Publication
Application
Priority
JP 9330990 A 19900410
Abstract (en)
A plasma processing method for use with plasma processing apparatus (10), comprises the steps of generating plasma containing electrically-neutral reaction species in a plasma generating area (40) and processing a workpiece (30) by said reaction species in a processing area (60). The method further comprises generating a mirror magnetic field between said plasma generating area (40) and said processing area (60) so as to restrict charged particles from moving from said plasma generating area (40) to said processing area (60). <IMAGE>
IPC 1-7
IPC 8 full level
H01L 21/302 (2006.01); H01J 37/32 (2006.01); H01L 21/205 (2006.01); H01L 21/3065 (2006.01)
CPC (source: EP US)
H01J 37/32091 (2013.01 - EP US); H01J 37/32357 (2013.01 - EP US); H01J 37/32623 (2013.01 - EP US); H01J 37/3266 (2013.01 - EP US)
Designated contracting state (EPC)
DE FR GB
DOCDB simple family (publication)
EP 0451943 A2 19911016; EP 0451943 A3 19920122; JP H047827 A 19920113; JP H0775226 B2 19950809; US 5114529 A 19920519
DOCDB simple family (application)
EP 91301839 A 19910306; JP 9330990 A 19900410; US 68282591 A 19910409