Global Patent Index - EP 0454584 A1

EP 0454584 A1 19911030 - Process and apparatus for decontamination using ion etching.

Title (en)

Process and apparatus for decontamination using ion etching.

Title (de)

Verfahren und Vorrichtung zur Dekontaminierung durch Ionenätzen.

Title (fr)

Procédé et dispositif de décontamination par décapage ionique.

Publication

EP 0454584 A1 19911030 (FR)

Application

EP 91401101 A 19910425

Priority

FR 9005417 A 19900427

Abstract (en)

According to the invention, in order to decontaminate an object (2) whose surface is contaminated by a contaminating material, at least a part of the surface is covered with an enclosure (6), this part, taken as a target, is etched by cathodic sputtering and the contaminating material thus removed is collected on a substrate (12) contained in the enclosure. Application to the decontamination of objects contaminated with radioactive materials. <IMAGE>

IPC 1-7

G21F 9/00

IPC 8 full level

G21F 9/28 (2006.01); B08B 7/00 (2006.01); C23G 5/00 (2006.01); G21F 9/00 (2006.01)

CPC (source: EP)

B08B 7/0035 (2013.01); C23G 5/00 (2013.01); G21F 9/005 (2013.01)

Citation (search report)

Designated contracting state (EPC)

BE CH DE FR GB IT LI NL

DOCDB simple family (publication)

EP 0454584 A1 19911030; EP 0454584 B1 19950802; DE 69111671 D1 19950907; DE 69111671 T2 19960404; FR 2661544 A1 19911031; FR 2661544 B1 19940527; JP 2892857 B2 19990517; JP H04230898 A 19920819

DOCDB simple family (application)

EP 91401101 A 19910425; DE 69111671 T 19910425; FR 9005417 A 19900427; JP 9598391 A 19910426