Global Patent Index - EP 0464383 A3

EP 0464383 A3 19920715 - PLASMA NEUTRALISATION CATHODE

Title (en)

PLASMA NEUTRALISATION CATHODE

Publication

EP 0464383 A3 19920715 (EN)

Application

EP 91109114 A 19910604

Priority

SU 4843045 A 19900626

Abstract (en)

[origin: EP0464383A2] A plasma compensation cathode comprises a casing (1) accommodating coaxially with its outlet hole (2) a hollow holder (3) and a thermal emitter (4) with a central passage (5), a layer (10) of material chemically inert at high temperatures to the materials of the holder and emitter being interposed therebetween. The central passage (5) is blind at the side of admission of gas, and is communicated with the interior of the holder (3) by way of a through passage (8) made in the wall of the thermal emitter (4) so that its axis intersects the axis of passage (5), and longitudinal grooves (9) made in the side surface of the thermal emitter (4) at the location of the inlet holes of the through passage (8). The holder (3) is embraced by heater (6) having a support ring (7) positioned in its midportion and secured in an insulation sleeve (18) separating the heater (6) from the coaxial heat screens (11) interconnected successively to define a sealed cavity (14) wherethrough the interior of the holder (3) communicates with the gas feeding pipe (13) secured in the casing (1) through the support insulator (17). Interposed between mechanical filters (16) and between holder (3) and pipe (13) is a getter (15). <IMAGE>

IPC 1-7

H01J 3/02

IPC 8 full level

H05H 1/34 (2006.01); F03H 1/00 (2006.01); H01J 3/02 (2006.01); H01J 37/077 (2006.01); H05H 1/24 (2006.01); H05H 1/54 (2006.01)

CPC (source: EP)

H01J 3/025 (2013.01)

Citation (search report)

  • [A] PROCEEDINGS OF THE 8TH SYMPOSIUM ON ENGENEERING PROBLEMS OF FUSION RESEARCH vol. 2, 1979, NEW YORK pages 1038 - 1043; D.E. SCHECTER: 'HOLLOW CATHODE FOR POSITIVE ION SOURCES'
  • [A] PATENT ABSTRACTS OF JAPAN vol. 7, no. 204 (E-197)(1349) 9 September 1983 & JP-A-58 102 440 ( TOKYO SHIBAURA DENKI K K ) 18 June 1983
  • [A] PATENT ABSTRACTS OF JAPAN vol. 7, no. 292 (E-219)(1437) 27 December 1983 & JP-58 169 752 ( TOKYO SHIBAURA DENKI K K ) 6 October 1983

Designated contracting state (EPC)

AT CH DE FR GB IT LI NL

DOCDB simple family (publication)

EP 0464383 A2 19920108; EP 0464383 A3 19920715; EP 0464383 B1 19940921; AT E112096 T1 19941015; DE 69104142 D1 19941027; DE 69104142 T2 19950119; JP 2963903 B2 19991018; JP H04299000 A 19921022; RU 2012946 C1 19940515

DOCDB simple family (application)

EP 91109114 A 19910604; AT 91109114 T 19910604; DE 69104142 T 19910604; JP 18013491 A 19910625; SU 4843045 A 19900626