Global Patent Index - EP 0472169 A3

EP 0472169 A3 19921021 - PLANT MONITORING AND CONTROL SYSTEM

Title (en)

PLANT MONITORING AND CONTROL SYSTEM

Publication

EP 0472169 A3 19921021 (EN)

Application

EP 91113945 A 19910820

Priority

JP 21806990 A 19900821

Abstract (en)

[origin: EP0472169A2] A plant monitoring and control system is specialized in a plant such as a reactor power plant, which is provided with plural process systems (A, B, ...N) functionally divided, and is communicable between the process systems with broadcast communication. Detection signals corresponding to process variables of the process systems, detected by the detectors (11A, 11B, ... 11N), are supplied into the transmission line (14) by the remote process input-output unit (13A, 13B ... 13N). Command signals can be also supplied into the line via a input unit (161A, 161B ... 161N) and a console controller (162A, 162B ... 162N) of a corresponding operator console (16A, 16B ... 16N). A corresponding process controller (15A, 15B ... 15N) takes in the detection signals and command signals from the line (14) and returns calculated control signals into the line. The remote process input-output unit (13A, 13B ... 13N) controls the corresponding process device (12A, 12B ... 12N) by giving the control signals. Each of the process controllers incorporates a control backup element against control failure of other process controllers, then eliminating the multiplex construction of the process controller (15A, 15B ... 15N) for a redundant system. The console controller (162A, 162B ... 162N) controls images on a display unit (163A, 163B ... 163N) in the corresponding operator console (16A, 16B ... 16N). A display backup element can also be incorporated in the console controllers respectively, then simplifying the console construction. <IMAGE>

IPC 1-7

G05B 23/02

IPC 8 full level

G05B 9/03 (2006.01); G05B 23/02 (2006.01); G06F 11/20 (2006.01); G21C 17/00 (2006.01); G21D 3/00 (2006.01); H04Q 9/00 (2006.01)

CPC (source: EP US)

G05B 23/0272 (2013.01 - EP US); G06F 11/2017 (2013.01 - EP US); G06F 11/2035 (2013.01 - EP US); G21C 17/00 (2013.01 - EP US); G05B 2223/06 (2018.07 - EP US); Y02E 30/30 (2013.01 - EP US); Y04S 10/52 (2013.01 - EP US)

Citation (search report)

  • [Y] DE 3214328 A1 19821216 - HITACHI LTD [JP]
  • [A] US 4500951 A 19850219 - SUGIMOTO NORIHIKO [JP], et al
  • [Y] ABB REVIEW. no. 8/9, 1989, ZURICH CH pages 31 - 36; J. BODIN: 'ENHANCED AVAILABILITY FOR PROCESS CONTROL SYSTEMS'
  • [A] ADVANCES IN INSTRUMENTATION AND CONTROL. vol. 44, no. 1, 1989, PITTSBURGH US pages 141 - 152; S. MORGAN ET AL: 'RELIABLE CONTROL SYSTEM FOR LNG GASIFICATION PLANT'

Designated contracting state (EPC)

DE FR GB

DOCDB simple family (publication)

EP 0472169 A2 19920226; EP 0472169 A3 19921021; EP 0472169 B1 19960612; DE 69120168 D1 19960718; DE 69120168 T2 19970220; JP H04101201 A 19920402; US 5270917 A 19931214

DOCDB simple family (application)

EP 91113945 A 19910820; DE 69120168 T 19910820; JP 21806990 A 19900821; US 74767191 A 19910820