Global Patent Index - EP 0486149 A2

EP 0486149 A2 19920520 - Method and apparatus for reducing tilt angle variations in an ion implanter.

Title (en)

Method and apparatus for reducing tilt angle variations in an ion implanter.

Title (de)

Verfahren und Gerät zur Reduzierung der Neigungswinkelschwankungen in einer Ionenimplantierungsmaschine.

Title (fr)

Méthode et appareil pour réduire les variations de l'angle d'inclinaison dans un implanteur ionique.

Publication

EP 0486149 A2 19920520 (EN)

Application

EP 91309036 A 19911002

Priority

US 59236390 A 19901003

Abstract (en)

An ion beam implantation system (10). An ion beam (14) is controllably deflected from an initial trajectory as it passes through spaced parallel plates (26, 28) that are biased by a control circuit. Once deflected, the ion beam enters an electrostatic lens (30) that redeflects the once deflected ion beam. When the beam exits the lens, it moves along a trajectory that impacts a workpiece. By controlled deflection of the beam, multiple parallel beam paths result, all of which input the workpiece at a uniform impact angle. <IMAGE>

IPC 1-7

H01J 37/147; H01J 37/317

IPC 8 full level

C23C 14/48 (2006.01); H01J 37/147 (2006.01); H01J 37/317 (2006.01); H01L 21/265 (2006.01)

CPC (source: EP KR)

H01J 37/1477 (2013.01 - EP); H01J 37/317 (2013.01 - KR); H01J 37/3171 (2013.01 - EP)

Designated contracting state (EPC)

DE FR GB

DOCDB simple family (publication)

EP 0486149 A2 19920520; EP 0486149 A3 19920610; EP 0486149 B1 19961218; DE 69123708 D1 19970130; DE 69123708 T2 19970710; JP 3106214 B2 20001106; JP H04280054 A 19921006; KR 920008846 A 19920528; KR 970002681 B1 19970308

DOCDB simple family (application)

EP 91309036 A 19911002; DE 69123708 T 19911002; JP 28206191 A 19911002; KR 910017170 A 19911001