Global Patent Index - EP 0487794 A1

EP 0487794 A1 19920603 - Process for preparing resist patterns.

Title (en)

Process for preparing resist patterns.

Title (de)

Verfahren zur Herstellung von Photolackmustern.

Title (fr)

Procédé pour la préparation de patrons de photoréserve.

Publication

EP 0487794 A1 19920603 (EN)

Application

EP 90312862 A 19901127

Priority

EP 90312862 A 19901127

Abstract (en)

A process for preparing a resist pattern for lithography from a chemically amplified resist (21) composed of a photoactive acid generator includes a step of controlling a photoactive acid catalyzed reaction, induced by the acid generator, adjacent to an area of the surface which is subjected to excess irradiation. The reaction control may be performed by trapping excess acid generated adjacent to areas of the resist surface, by forming a temperature gradient in the resist to restrict the photoactive reaction in selected areas, or by charging the resist (21) in its thickness direction to move positive charge from the generated acid for establishing homogeneous charge distribution in the resist (21). <IMAGE>

IPC 1-7

G03F 7/004; G03F 7/022; G03F 7/16; G03F 7/38

IPC 8 full level

G03F 7/004 (2006.01); G03F 7/022 (2006.01); G03F 7/16 (2006.01); G03F 7/38 (2006.01)

CPC (source: EP)

G03F 7/0045 (2013.01); G03F 7/0226 (2013.01); G03F 7/168 (2013.01); G03F 7/38 (2013.01)

Citation (search report)

  • [X] US 4775609 A 19881004 - MCFARLAND MICHAEL J [US]
  • [Y] GB 2171530 A 19860828 - IMTEC PRODUCTS INC
  • [Y] IBM TECHNICAL DISCLOSURE BULLETIN. vol. 21, no. 6, November 1978, NEW YORK US & PAAL G.: "CONTROL OF DEVELOPED IMAGE IN AZ-TYPE PHOTO AND ELECTRON RESIST"
  • [Y] RESEARCH DISCLOSURE. no. 259, November 1985, HAVANT GB page 574 ANONYMOUS: "ENHANCED PHOTORESIST DEVELOPING AND STRIPPING"
  • [A] IBM TECHNICAL DISCLOSURE BULLETIN. vol. 15, no. 2, July 1972, NEW YORK US page 426 TAFT L.G.: "ELECTROSTATICALLY REMOVING COATING SPRAY WHILE SPIN COATING"
  • [A] PATENT ABSTRACTS OF JAPAN vol. 12, no. 298 (P-744)(3145) 15 August 1988, & JP-A-63 71842 (HITACHI LTD) 01 April 1988,

Designated contracting state (EPC)

DE FR GB

DOCDB simple family (publication)

EP 0487794 A1 19920603

DOCDB simple family (application)

EP 90312862 A 19901127