EP 0515488 A1 19921202 - IMPROVED INSTALLATION FOR WAFER TRANSFER AND PROCESSING.
Title (en)
IMPROVED INSTALLATION FOR WAFER TRANSFER AND PROCESSING.
Title (de)
VERBESSERTE EINRICHTUNG ZUM TRANSPORT UND ZUR BEHANDLUNG VON SCHEIBCHEN.
Title (fr)
INSTALLATION AMELIOREE DE TRANSFERT ET DE TRAITEMENT DES TRANCHES.
Publication
Application
Priority
- NL 9000374 A 19900216
- NL 9000376 A 19900216
- NL 9000579 A 19900314
- NL 9000903 A 19900417
- NL 9001177 A 19900521
- NL 9001400 A 19900620
- NL 9001862 A 19900823
- NL 9100237 A 19910211
Abstract (en)
[origin: WO9112629A1] Installation (10) for transfer and processing of wafers (26), whereby for an at least contamination-free wafer transfer in cleaning module (12) an all-sided wafer cleaning takes place within an inert gas environment, within an at least temporary established medium discharge gap, located in between chamber blocks (20 and 22), and extending in laterally outward direction from cleaning chamber (24) toward discharge passage (28), at least jointly by means of said inert gas a sealing-off system is accomplished for a controlled discharge of the cleaning medium from said cleaning chamber.
Abstract (fr)
Installation (10) de transfert et de traitement des tranches (26), dans laquelle un transfert de tranches sensiblement sans contamination s'effectue vers un module de nettoyage (12) qui nettoie toutes les faces des tranches dans un milieu gazeux inerte. La décharge contrôlée de la chambre de nettoyage (24) du milieu de nettoyage s'effectue au moins en partie à l'aide dudit gaz inerte et dans un système de fermeture hermétique placé dans un espace de décharge prédéterminé et au moins temporaire situé entre des chambres (20 et 22) et s'étendant latéralement vers l'extérieur à partir de la chambre de nettoyage (24) et vers un passage de décharge (28).
IPC 1-7
IPC 8 full level
B08B 7/00 (2006.01); H01L 21/00 (2006.01); H01L 21/027 (2006.01); H01L 21/304 (2006.01); H01L 21/677 (2006.01)
CPC (source: EP KR)
H01L 21/00 (2013.01 - KR); H01L 21/67028 (2013.01 - EP); H01L 21/67051 (2013.01 - EP); H01L 21/67057 (2013.01 - EP); H01L 21/67161 (2013.01 - EP); H01L 21/67167 (2013.01 - EP); H01L 21/67784 (2013.01 - EP)
Citation (search report)
See references of WO 9112629A1
Designated contracting state (EPC)
DE FR GB
DOCDB simple family (publication)
WO 9112629 A1 19910822; EP 0515488 A1 19921202; JP H06500427 A 19940113; KR 920704332 A 19921219
DOCDB simple family (application)
NL 9100025 W 19910215; EP 91904444 A 19910215; JP 50479691 A 19910215; KR 920701972 A 19920817