EP 0521721 A3 19930421 - METHOD FOR MANUFACTURING A SHADOW MASK BY RESIST ETCHING
Title (en)
METHOD FOR MANUFACTURING A SHADOW MASK BY RESIST ETCHING
Publication
Application
Priority
- JP 16157891 A 19910702
- JP 17910891 A 19910719
Abstract (en)
[origin: EP0521721A2] A steel sheet (1) of thickness 20-80 mu m is coated on each surface with a resist layer (2), e.g. of casein, and (Fig 1) one surface only is patternwise exposed to light through a glass mask (31), the resultant pattern of holes is developed (baked) and the unpatterned resist (2) is covered by coating or adhesive with a non-etchable layer of a resin (5), the patterned resist (2) is etched, e.g. with ferric chloride, and the resists and resin layer removed to provide a shadow mask (1) having etched through-holes. In a variant (Fig 4) a large opening (311) 3 -5 times the thickness of the sheet is patterned in a resist (21) on one side, one or more small openings (321, 322) patterned opposite thereto on the other resist, and etching is performed from each side; a layer of non-etchable material (4) is coated on the second side and into the small holes before a final etching from the first side; a large through-hole is formed. The resin covering (5) must resist pressure of etching solution and have strength to maintain the flatness of the sheet (1) and can be alkali- or solvent-soluble, UV-setting or hot-melt; an adhesive film should be anti-acid. The holes can be formed as a slot or slit and they have satisfactory accuracy of shape and dimension. The masks can be used for a large color cathode ray tube.
IPC 1-7
IPC 8 full level
CPC (source: EP US)
G03F 1/20 (2013.01 - EP US); H01J 9/142 (2013.01 - EP US)
Citation (search report)
- [X] US 4755257 A 19880705 - YAMAMOTO TOSHIO [JP], et al
- [X] US 4362595 A 19821207 - SKOG JACK E
- [A] FR 2297258 A1 19760806 - PHILIPS NV [NL]
- [Y] US 3929532 A 19751230 - KUZMINSKI HENRY WILLIAM
- [Y] DE 2005151 A1 19710225 - BUCKBEE MEARS CO
- [X] PATENT ABSTRACTS OF JAPAN vol. 014, no. 007 (C-673)10 January 1989 & JP-A-1 252 788 ( NISSHA PRINTING CO LTD ) 9 October 1989
- [Y] PATENT ABSTRACTS OF JAPAN vol. 013, no. 111 (C-577)16 March 1989 & JP-A-63 286 588 ( TOSHIBA CORP ) 24 November 1988
Designated contracting state (EPC)
DE GB NL
DOCDB simple family (publication)
EP 0521721 A2 19930107; EP 0521721 A3 19930421; EP 0521721 B1 19991013; DE 69230119 D1 19991118; DE 69230119 T2 20000330; US 5348825 A 19940920; US 5567555 A 19961022
DOCDB simple family (application)
EP 92306117 A 19920702; DE 69230119 T 19920702; US 22105894 A 19940329; US 90819492 A 19920701