EP 0534204 B1 19970604 - Base developable negative photoresist and use thereof
Title (en)
Base developable negative photoresist and use thereof
Title (de)
In basischem Medium entwickelbarer, negativer Photoresist und seine Verwendung
Title (fr)
Photoréserve de type négatif développable en milieu basique et son emploi
Publication
Application
Priority
US 76659691 A 19910926
Abstract (en)
[origin: EP0534204A1] A composition containing novolak polymer, and/or poly(p-vinylphenol), an organometallic material, an amino polymer a cationic photocatalyst. The composition can also include a cosensitizer material which makes a composition sensitive to near U.V. radiation.
IPC 1-7
IPC 8 full level
G03F 7/004 (2006.01); G03F 7/029 (2006.01); G03F 7/038 (2006.01); G03F 7/075 (2006.01); H01L 21/027 (2006.01); H01L 21/30 (2006.01)
CPC (source: EP US)
G03F 7/038 (2013.01 - EP US); Y10S 430/107 (2013.01 - EP US); Y10S 430/11 (2013.01 - EP US); Y10S 430/115 (2013.01 - EP US)
Designated contracting state (EPC)
DE FR GB
DOCDB simple family (publication)
EP 0534204 A1 19930331; EP 0534204 B1 19970604; DE 69220163 D1 19970710; DE 69220163 T2 19971218; JP 2683536 B2 19971203; JP H05224421 A 19930903; US 5286599 A 19940215
DOCDB simple family (application)
EP 92115167 A 19920904; DE 69220163 T 19920904; JP 20784792 A 19920804; US 76659691 A 19910926