Global Patent Index - EP 0563954 A1

EP 0563954 A1 19931006 - Method for polishing plate and apparatus therefor.

Title (en)

Method for polishing plate and apparatus therefor.

Title (de)

Verfahren zum Plattenpolieren und Vorrichtung dafür.

Title (fr)

Méthode pour le polissage d'une plaque et appareil pour cela.

Publication

EP 0563954 A1 19931006

Application

EP 93105411 A 19930401

Priority

JP 11076992 A 19920402

Abstract (en)

Disclosed is a method for specular polishing the surface of a metal or non-metal plate (10) to be polished, especially a large-sized plate, in which the surface of the plate is polished by rotating a polishing member (9) via cranks (36, 37), while pressing the polishing member against the surface of the plate at a predetermined pressure. Since the polishing member is rotated via cranks, while being pressed against the surface of the plate at a predetermined pressure, the predetermined pressure is uniformly distributed over the entire surface to be polished, hence, precise and uniform specular polishing of even a large-sized plate is feasible. <IMAGE>

IPC 1-7

B24B 1/04; B24B 37/04

IPC 8 full level

B24B 1/04 (2006.01); B24B 7/19 (2006.01); B24B 29/00 (2006.01); B24B 37/00 (2006.01); B24B 37/005 (2012.01); B24B 37/04 (2006.01); B24B 37/07 (2012.01); B24B 37/10 (2012.01); B24B 41/047 (2006.01)

CPC (source: EP)

B24B 1/04 (2013.01); B24B 37/04 (2013.01); B24B 41/047 (2013.01)

Citation (search report)

Designated contracting state (EPC)

DE FR GB IT

DOCDB simple family (publication)

EP 0563954 A1 19931006; EP 0563954 B1 19970827; CA 2093046 A1 19931003; CN 1077406 A 19931020; DE 69313333 D1 19971002; DE 69313333 T2 19980326; JP 2724427 B2 19980309; JP H05277914 A 19931026; TW 223601 B 19940511

DOCDB simple family (application)

EP 93105411 A 19930401; CA 2093046 A 19930331; CN 93103507 A 19930402; DE 69313333 T 19930401; JP 11076992 A 19920402; TW 82102453 A 19930401