EP 0565006 A3 19940223 -
Publication
Application
Priority
JP 8418192 A 19920406
Abstract (en)
[origin: EP0565006A2] A method for preparing a PS plate comprises the steps of treating an anodized aluminum plate with an aqueous solution of an alkali metal silicate having a pH ranging from 10 to 13 as determined at 25 DEG C, then treating the aluminum plate with an aqueous solution of an acid having a pH ranging from 1 to 6 and applying a light-sensitive layer onto the aluminum plate thus treated. The aluminum substrate of the PS plate is only slightly dissolved in an alkaline developer and this accordingly prevents the formation of insoluble compounds or sludge effectively, during development.
IPC 1-7
IPC 8 full level
CPC (source: EP)
B41N 3/034 (2013.01)
Citation (search report)
- [X] EP 0089510 A1 19830928 - HOECHST CO AMERICAN [US]
- [XD] EP 0149490 A2 19850724 - FUJI PHOTO FILM CO LTD [JP]
- [XD] EP 0110417 A2 19840613 - FUJI PHOTO FILM CO LTD [JP]
- [PX] EP 0497351 A1 19920805 - FUJI PHOTO FILM CO LTD [JP]
- [A] FR 2202308 A1 19740503 - OCE VAN DER GRINTEN NV [NL]
- [A] DE 1118009 B 19611123 - POLYCHROME CORP
- [AD] PATENT ABSTRACTS OF JAPAN vol. 014, no. 464 (M - 1033) 9 October 1990 (1990-10-09)
Designated contracting state (EPC)
DE GB NL
DOCDB simple family (publication)
EP 0565006 A2 19931013; EP 0565006 A3 19940223; EP 0565006 B1 19980729; DE 69319954 D1 19980903; DE 69319954 T2 19981210; JP 2944296 B2 19990830; JP H05278362 A 19931026
DOCDB simple family (application)
EP 93105536 A 19930402; DE 69319954 T 19930402; JP 8418192 A 19920406