EP 0579420 B1 19970305 - Negative working resist material and pattern forming process
Title (en)
Negative working resist material and pattern forming process
Title (de)
Negativ-arbeitendes Schutzlackmaterial und Verfahren zur Herstellung von Mustern
Title (fr)
Matériau formant réserve négative et procédé pour former des patrons
Publication
Application
Priority
JP 21096192 A 19920715
Abstract (en)
[origin: EP0579420A2] A negative working resist composition comprising (a) an alkali-soluble resin, (b) an aromatic compound having at least two groups of the formula: -OCH2OR<1> wherein R<1> is alkyl or aralkyl, (c) a photoacid generator, and (d) a solvent, can form fine patterns with high resolution when exposed to deep UV, KrF excimer laser light, etc. due to high light transmittance and high sensitivity.
IPC 1-7
IPC 8 full level
G03F 7/038 (2006.01); G03F 7/004 (2006.01)
CPC (source: EP KR US)
G03F 7/00 (2013.01 - KR); G03F 7/0382 (2013.01 - EP US); G03F 7/0045 (2013.01 - EP US)
Designated contracting state (EPC)
DE FR GB
DOCDB simple family (publication)
EP 0579420 A2 19940119; EP 0579420 A3 19950614; EP 0579420 B1 19970305; DE 69308408 D1 19970410; DE 69308408 T2 19970821; KR 100232387 B1 19991201; KR 940005993 A 19940322; US 5389491 A 19950214
DOCDB simple family (application)
EP 93305170 A 19930701; DE 69308408 T 19930701; KR 930013241 A 19930714; US 8239993 A 19930628