Global Patent Index - EP 0582625 B1

EP 0582625 B1 19960124 - PROCESS AND DEVICE FOR THE CONTROLLED METERING OF AT LEAST ONE POURABLE COMPONENT

Title (en)

PROCESS AND DEVICE FOR THE CONTROLLED METERING OF AT LEAST ONE POURABLE COMPONENT

Title (de)

VERFAHREN UND VORRICHTUNG ZUR KONTROLLIERTEN DOSIERUNG MINDESTENSEINER FLIESSFÄHIGEN KOMPONENTE

Title (fr)

PROCEDE ET DISPOSITIF POUR LE DOSAGE CONTROLE D'AU MOINS UN COMPOSANT COULANT

Publication

EP 0582625 B1 19960124 (DE)

Application

EP 92909623 A 19920504

Priority

  • DE 9200352 W 19920504
  • DE 4114438 A 19910503

Abstract (en)

[origin: WO9219867A1] In a process for the controlled metering of at least one pourable component, two force pumps (1, 2) driven by a smooth hydraulic current, each with an oscillating force component (9, 10), are used whereby the hydraulic current is divided in a current divider in such a way that one force pump, then both together and then the other identical force pump are driven alternately by this hydraulic current. The volume flow from the force pumps (1, 2) is also smooth and also free of leaks owing to the sealing tests performed on a force pump (1, 2) during the inoperative period. A device for implementing the process is also described.

IPC 1-7

F04B 43/02; F04B 43/073

IPC 8 full level

F04B 9/115 (2006.01); F04B 11/00 (2006.01); F04B 43/02 (2006.01); F04B 43/073 (2006.01); F04B 49/10 (2006.01)

CPC (source: EP US)

F04B 9/115 (2013.01 - EP); F04B 11/005 (2013.01 - EP US); F04B 43/0736 (2013.01 - EP US)

Designated contracting state (EPC)

AT BE CH DE FR GB IT LI LU NL SE

DOCDB simple family (publication)

WO 9219867 A1 19921112; AT E133471 T1 19960215; DE 59205185 D1 19960307; EP 0582625 A1 19940216; EP 0582625 B1 19960124; EP 0582625 B2 20050105; JP H06506999 A 19940804

DOCDB simple family (application)

DE 9200352 W 19920504; AT 92909623 T 19920504; DE 59205185 T 19920504; EP 92909623 A 19920504; JP 50895492 A 19920504