EP 0609507 B1 19960327 - Electrolytic process for obtaining high purity platinum from impure platinum
Title (en)
Electrolytic process for obtaining high purity platinum from impure platinum
Title (de)
Elektrolytisches Verfahren zur Gewinnung von Platin hoher Reinheit aus verunreinigtem Platin
Title (fr)
Procédé électrolytique pour obtention de platine de haute pureté à partir de platine impur
Publication
Application
Priority
DE 4243699 A 19921218
Abstract (en)
[origin: US5393389A] The electrolytic process for obtaining platinum of high purity from a concentrated hydrochloric acid solution of contaminated platinum containing base and noble metal impurities includes electrolyzing the hydrochloric acid solution containing the contaminated platinum in an electrolysis cell subdivided by a cation exchanger membrane under potentiostatic or voltage-controlled conditions with a voltage of 2.5 V to 8 V applied across the anode and cathode under a current density of 0.3 to 12.5 A/dm2 so as to form a refined platinum-containing solution and a platinum alloy metal deposit. The concentrated hydrochloric acid solutions used in the process can have a contaminated platinum content of 50 to 700 g/l and total metal impurities of </=5000 ppm. In contrast to the known prior art processes, the process according to the invention operates with minimal requirements in terms of safety technology and equipment, causes a minimal environmental burden and is far less time-consuming and more economical.
IPC 1-7
IPC 8 full level
C01G 55/00 (2006.01); C25B 1/00 (2006.01); C25C 1/00 (2006.01); C25C 1/20 (2006.01)
CPC (source: EP US)
C25C 1/20 (2013.01 - EP US)
Designated contracting state (EPC)
AT CH DE FR GB IT LI
DOCDB simple family (publication)
US 5393389 A 19950228; AT E136066 T1 19960415; CA 2111793 A1 19940619; CA 2111793 C 20030513; DE 4243699 C1 19940210; DE 59302052 D1 19960502; EP 0609507 A1 19940810; EP 0609507 B1 19960327; FI 100607 B 19980115; FI 935661 A0 19931216; FI 935661 A 19940619; JP 3286823 B2 20020527; JP H06280074 A 19941004; RU 2093607 C1 19971020; ZA 938994 B 19940803
DOCDB simple family (application)
US 17042293 A 19931220; AT 93118981 T 19931125; CA 2111793 A 19931217; DE 4243699 A 19921218; DE 59302052 T 19931125; EP 93118981 A 19931125; FI 935661 A 19931216; JP 34329093 A 19931217; RU 93056629 A 19931217; ZA 938994 A 19931201