Global Patent Index - EP 0643335 A1

EP 0643335 A1 19950315 - Optical system for the projection of patterned light onto the surface of three dimensional objects.

Title (en)

Optical system for the projection of patterned light onto the surface of three dimensional objects.

Title (de)

Optisches System zur Projektion musterübertragenden Lichtes auf die Oberfläche dreidimensionaler Gegenstände.

Title (fr)

Système optique de projection de lumière de transfert de motif vers la surface d'objets tridimensionnels.

Publication

EP 0643335 A1 19950315 (EN)

Application

EP 94110626 A 19940707

Priority

US 11046693 A 19930823

Abstract (en)

An image projection system for all surfaces of a three dimensional object (7) such as a polyhedron in which direct and angle reflected image patterns are projected from superpositioned non-overlapping mask patterns (5,8) mounted on different levels (3,4) where the separation (S) of the levels is related to the size of the object. the apparatus and process permits simultaneous photolithographic printing of conduc tors on the top and all sides of a cube shaped stack of integrated circuit chips. <IMAGE>

IPC 1-7

G03F 7/20; G03F 7/24

IPC 8 full level

G03F 7/20 (2006.01); G03F 7/24 (2006.01); H01L 21/027 (2006.01)

CPC (source: EP US)

G03F 7/24 (2013.01 - EP US); G03F 7/70241 (2013.01 - EP US); G03F 7/703 (2013.01 - EP US)

Citation (search report)

  • [Y] US 1658509 A 19280207 - BEEBE MURRAY C
  • [Y] PATENT ABSTRACTS OF JAPAN vol. 9, no. 13 (P - 328) 19 January 1985 (1985-01-19)
  • [A] H.R. ROTTMAN ET AL.: "THREE-DIMENSIONAL PHOTOLITHOGRAPHIC MASK", IBM TECHNICAL DISCLOSURE BULLETIN., vol. 13, no. 4, September 1970 (1970-09-01), NEW YORK US, pages 879 - 880

Designated contracting state (EPC)

DE FR GB

DOCDB simple family (publication)

EP 0643335 A1 19950315; JP 2718421 B2 19980225; JP H0786157 A 19950331; US 5461455 A 19951024

DOCDB simple family (application)

EP 94110626 A 19940707; JP 17422794 A 19940726; US 11046693 A 19930823