EP 0662223 A1 19950712 - PHOTORESIST STRIPPING PROCESS USING N,N-DIMETHYL-BIS(2-HYDROXYETHYL) QUATERNARY AMMONIUM HYDROXIDE.
Title (en)
PHOTORESIST STRIPPING PROCESS USING N,N-DIMETHYL-BIS(2-HYDROXYETHYL) QUATERNARY AMMONIUM HYDROXIDE.
Title (de)
PHOTOLACKENTSCHICHTUNGSVERFAHREN MITTELS N,N-DIMETHYL-BIS (2-HYDROXYETHYL) QUATERNAEREN AMMONIUM HYDROXIOL.
Title (fr)
PROCEDE D'ELIMINATION D'AGENTS PHOTORESISTANTS EMPLOYANT DU M,M-DIMETHYLE-BIS(2-HYDROXYETHYLE) HYDROXYDE D'AMMONIUM QUATERNAIRE.
Publication
Application
Priority
- US 9308852 W 19930923
- US 95211292 A 19920928
Abstract (en)
[origin: WO9408276A1] A process for stripping photo-resists and an aqueous bath for use in the process are disclosed. The process is carried out at 40 to 100 C for about 0.1 to 10 minutes. The aqueous bath contains 1 to 10 weight percent N,N-dimethyl-bis(2-hydroxyethyl) quaternary ammonium hydroxide and preferably 0.5 to 10 weight percent of a metal complexing agent such as monoethanol amine, ethylene diamine, ethylene diamine tetraacetic, melamine, nitrillotriacetic acid, morpholine, acetonylacetone, and preferably from 0.1 to 5 weight percent ammonia.
IPC 1-7
IPC 8 full level
G03F 7/42 (2006.01); H01L 21/027 (2006.01)
CPC (source: EP)
G03F 7/425 (2013.01)
Citation (search report)
See references of WO 9408276A1
Designated contracting state (EPC)
DE FR GB IT NL
DOCDB simple family (publication)
WO 9408276 A1 19940414; AU 4929993 A 19940426; EP 0662223 A1 19950712; JP H08502367 A 19960312
DOCDB simple family (application)
US 9308852 W 19930923; AU 4929993 A 19930923; EP 93921680 A 19930923; JP 50911294 A 19930923