EP 0671658 B8 20021211 - Exposure apparatus and reflection type mask to be used in the same
Title (en)
Exposure apparatus and reflection type mask to be used in the same
Title (de)
Belichtungsgerät sowie dazu gehörende Reflexionsmaske
Title (fr)
Appareil d'exposition ainsi que masque à réflexion
Publication
Application
Priority
JP 3171294 A 19940302
Abstract (en)
[origin: EP0671658A2] A reflection type mask includes a reflective portion having a multilayered film, a non-reflective portion having an absorbing material and being formed on the multilayered film, and a non-reflective portion being defined by destroying the multilayered film. <IMAGE>
IPC 1-7
IPC 8 full level
G03F 1/00 (2006.01); G03F 1/14 (2006.01); G03F 1/24 (2012.01); G03F 1/72 (2012.01); G03F 7/20 (2006.01); G03F 9/00 (2006.01); G21K 1/06 (2006.01); H01L 21/027 (2006.01)
CPC (source: EP US)
B82Y 10/00 (2013.01 - EP US); B82Y 40/00 (2013.01 - EP US); G03F 1/24 (2013.01 - EP US); G03F 1/72 (2013.01 - EP US); G03F 7/20 (2013.01 - EP US); G03F 7/70283 (2013.01 - EP US); G03F 9/70 (2013.01 - EP US); G21K 1/062 (2013.01 - EP US)
Designated contracting state (EPC)
FR GB NL
DOCDB simple family (publication)
EP 0671658 A2 19950913; EP 0671658 A3 19960313; EP 0671658 B1 20020612; EP 0671658 B8 20021211; JP H07240364 A 19950912; US 5549994 A 19960827
DOCDB simple family (application)
EP 95301087 A 19950221; JP 3171294 A 19940302; US 39367695 A 19950224