Global Patent Index - EP 0683248 B1

EP 0683248 B1 19971217 - Process for the after-treatment of plates, foils or strips and its application as substrate for offset printing plates

Title (en)

Process for the after-treatment of plates, foils or strips and its application as substrate for offset printing plates

Title (de)

Verfahren zur Nachbehandlung von platten-, folien- oder bandförmigem Material, Träger aus derartigem Material und seine Verwendung für Offsetdruckplatten

Title (fr)

Procédé de post-traitement de plaques, feuilles ou bandes et son application comme support pour plaques d'impression

Publication

EP 0683248 B1 19971217 (DE)

Application

EP 95107331 A 19950515

Priority

DE 4417907 A 19940521

Abstract (en)

[origin: EP0683248A1] Plates which have been chemically, mechanically or electrochemically roughened are anodised and then treated in an aqueous solution of a pure and crystalline alkali metal silicate followed by rinsing in an ion-containing water.

IPC 1-7

C25D 11/24; C25D 11/18; B41N 1/08

IPC 8 full level

B41M 7/00 (2006.01); B41N 1/08 (2006.01); B41N 3/03 (2006.01); C25D 11/18 (2006.01); C25D 11/20 (2006.01); C25D 11/24 (2006.01)

CPC (source: EP KR US)

B41N 1/08 (2013.01 - EP US); B41N 3/034 (2013.01 - KR); B41N 3/038 (2013.01 - EP KR US); C25D 11/18 (2013.01 - EP US); C25D 11/20 (2013.01 - KR); C25D 11/24 (2013.01 - EP KR US); B41N 1/083 (2013.01 - KR)

Designated contracting state (EPC)

AT BE DE FR GB IT NL

DOCDB simple family (publication)

EP 0683248 A1 19951122; EP 0683248 B1 19971217; AT E161297 T1 19980115; BR 9502487 A 19951219; DE 4417907 A1 19951123; DE 59501119 D1 19980129; JP H07316882 A 19951205; KR 950032719 A 19951222; US 5556531 A 19960917; US 5770315 A 19980623

DOCDB simple family (application)

EP 95107331 A 19950515; AT 95107331 T 19950515; BR 9502487 A 19950519; DE 4417907 A 19940521; DE 59501119 T 19950515; JP 12230595 A 19950522; KR 19950012654 A 19950520; US 43516295 A 19950505; US 61039296 A 19960304