Global Patent Index - EP 0689222 A3

EP 0689222 A3 19960207 - Method of manufacturing micropoint electron source and electron source obtained thereby

Title (en)

Method of manufacturing micropoint electron source and electron source obtained thereby

Title (de)

Herstellungsverfahren einer Mikrospitzelektronenquelle und nach dem Verfahren hergestellte Mikrospitzelektronenquelle

Title (fr)

Procédé de réalisation de sources d'électrons à micropointes et source d'électrons à micropointes obtenue par ce procédé

Publication

EP 0689222 A3 19960207 (FR)

Application

EP 95400910 A 19950424

Priority

  • FR 9404948 A 19940425
  • FR 9413972 A 19941122

Abstract (en)

[origin: FR2719156A1] A micro-tip electron source has micro-tips, each of which consists of a first frusto-conical portion (20) of a first conductive material and a second conical tip portion deposited on the first portion and made of a second conductive material which can be thinned by selective etching w.r.t. the first material. Pref. the first material is Nb and the second material is Mo, Si, Cr, Fe or Ni. Also claimed is a cathodoluminescent display device including the above micro-tip electron source. Pref. the height of the first portion (20) is such that its top is at the same level as the lower plane (I) of the grids (10a) of the source. The micro-tips are pref. subjected to cleaning and the second tip portion is subjected to thinning by surface etching.

IPC 1-7

H01J 9/02; H01J 1/30

IPC 8 full level

H01J 1/304 (2006.01); H01J 9/02 (2006.01)

CPC (source: EP US)

H01J 1/3042 (2013.01 - EP US); H01J 9/025 (2013.01 - EP US)

Citation (search report)

  • [XY] EP 0570211 A1 19931118 - MARCONI GEC LTD [GB]
  • [DXY] EP 0434330 A2 19910626 - SEIKO EPSON CORP [JP]
  • [DX] EP 0234989 A1 19870902 - COMMISSARIAT ENERGIE ATOMIQUE [FR]
  • [A] EP 0535953 A2 19930407 - SHARP KK [JP]
  • [A] EP 0443920 A1 19910828 - THOMSON CSF [FR]
  • [X] P R SCHWOEBEL ET AL.: "Field-emitter array performance enhancement using hydrogen glow discharges", APPLIED PHYSICS LETTERS., vol. 63, no. 1, NEW YORK US, pages 33 - 35, XP000382555, DOI: doi:10.1063/1.109741
  • [A] D STEPHANI ET AL.: "MICROFABRICATION OF METAL-COATED SILICON TIPS AND THEIR FIELD EMISSION PROPERTIES", MICROELECTRONIC ENGINEERING, vol. 13, no. 1/4, AMSTERDAM NL, pages 505 - 508, XP024436782, DOI: doi:10.1016/0167-9317(91)90142-Z

Designated contracting state (EPC)

DE GB IT

DOCDB simple family (publication)

FR 2719156 A1 19951027; FR 2719156 B1 19960524; CA 2146528 A1 19951026; DE 69514576 D1 20000224; DE 69514576 T2 20000810; DE 69531220 D1 20030807; DE 69531220 T2 20040527; EP 0689222 A2 19951227; EP 0689222 A3 19960207; EP 0689222 B1 20000119; EP 0856868 A2 19980805; EP 0856868 A3 19980930; EP 0856868 B1 20030702; US 5635790 A 19970603

DOCDB simple family (application)

FR 9413972 A 19941122; CA 2146528 A 19950406; DE 69514576 T 19950424; DE 69531220 T 19950424; EP 95400910 A 19950424; EP 98201095 A 19950424; US 42215995 A 19950414