EP 0697710 B1 19981111 - Manufacturing method for a micropoint-electron source
Title (en)
Manufacturing method for a micropoint-electron source
Title (de)
Herstellungsverfahren einer Mikrospitzen-Elektronenquelle
Title (fr)
Procédé de fabrication d'une source d'électrons à micropointes
Publication
Application
Priority
FR 9410041 A 19940816
Abstract (en)
[origin: EP0697710A1] A micro-tip electron source prodn. process involves: (a) producing a structure comprising an insulating substrate (10) bearing one or more cathode conductors (12) covered with an insulating layer (14) and then a conductive grid layer (16), holes (18) being formed through these layers (14,16) to each cathode conductor (12); and (b) forming a micro-tip of electron-emissive metal on the cathode conductor (12) in each hole (18), and an insulating protective layer (50) on the grid layer (16), depositing (pref. electrolytically) electron-emissive metal to overfill the holes, removing the protective layer and electrolytically etching the metal deposit (60) to form the micro-tips.
IPC 1-7
IPC 8 full level
H01J 1/30 (2006.01); H01J 1/304 (2006.01); H01J 9/02 (2006.01)
CPC (source: EP US)
H01J 9/025 (2013.01 - EP US)
Designated contracting state (EPC)
DE GB IT
DOCDB simple family (publication)
EP 0697710 A1 19960221; EP 0697710 B1 19981111; DE 69505914 D1 19981217; DE 69505914 T2 19990610; FR 2723799 A1 19960223; FR 2723799 B1 19960920; JP H0869749 A 19960312; US 5676818 A 19971014
DOCDB simple family (application)
EP 95401863 A 19950809; DE 69505914 T 19950809; FR 9410041 A 19940816; JP 20825195 A 19950815; US 51282795 A 19950809