EP 0736223 A1 19961009 - APPARATUS AND METHOD FOR PROCESSING OF SEMICONDUCTORS, SUCH AS SILICON CHIPS
Title (en)
APPARATUS AND METHOD FOR PROCESSING OF SEMICONDUCTORS, SUCH AS SILICON CHIPS
Title (de)
APPARAT UND HERSTELLUNGSVERFAHREN VON HALBLEITERN, WIE Z.B.SILIZIUMCHIPS
Title (fr)
APPAREIL ET PROCEDE DE TRAITEMENT DE SEMI-CONDUCTEURS TELS QUE DES PUCES EN SILICIUM
Publication
Application
Priority
- FI 9400574 W 19941220
- FI 935854 A 19931223
Abstract (en)
[origin: WO9518459A1] A method and apparatus for use in processing semiconductors, such as silicon wafers, the apparatus comprising two or more reactors (12, 14, 16) of essentially different type for processing silicon wafers in two or more essentially different processing stages. The system is kept under a constant vacuum. The processing of a silicon wafer takes place in succession in different reactors, so that while one reactor is in operation, the others are at the waiting stage. The reactors are connected to a common central unit which comprises vacuum equipment (18) common to the reactors, including a vacuum pump and/or turbo pump and gas distribution devices (20), and preferably a common silicon wafer loading chamber (10). The reactors are connected to the central unit in succession.
IPC 1-7
IPC 8 full level
H01L 21/00 (2006.01)
CPC (source: EP US)
H01L 21/67173 (2013.01 - EP US); H01L 21/67207 (2013.01 - EP US)
Citation (search report)
See references of WO 9518459A1
Designated contracting state (EPC)
DE GB NL
DOCDB simple family (publication)
WO 9518459 A1 19950706; EP 0736223 A1 19961009; FI 935854 A0 19931223; FI 935854 A 19950624; FI 95421 B 19951013; FI 95421 C 19960125; US 6174366 B1 20010116
DOCDB simple family (application)
FI 9400574 W 19941220; EP 95903370 A 19941220; FI 935854 A 19931223; US 65250696 A 19960531