EP 0744661 B1 19981007 - Positive photoresist composition
Title (en)
Positive photoresist composition
Title (de)
Positiv arbeitende Fotoresistzusammensetzungen
Title (fr)
Composition pour photoréserve de type positif
Publication
Application
Priority
JP 12519495 A 19950524
Abstract (en)
[origin: EP0744661A1] Disclosed is a positive photoresist composition comprising an alkali-soluble resin and 1,2-naphthoquinone-diazide-5- (and/or -4-)sulfonic esters of a polyhydroxy compound having a particular structure consisting of 5 aromatic rings linked linearly, in which each of the aromatic rings contains a hydroxyl group and the respective aromatic rings next to both the terminal rings contains a substituent group at the 5-position to the hydroxyl group thereof. The positive photoresist composition which has high resolution, low dependence of the resolution on film thickness, and broad latitude of development, leaves little development residue, and has very excellent storage stability without separation of photosensitive materials and generation of microgel (no increase in particle) with a lapse of time.
IPC 1-7
IPC 8 full level
G03F 7/023 (2006.01); G03F 7/022 (2006.01); H01L 21/027 (2006.01)
CPC (source: EP KR US)
G03F 7/022 (2013.01 - EP US); G03F 7/023 (2013.01 - KR)
Designated contracting state (EPC)
BE DE FR GB IT
DOCDB simple family (publication)
EP 0744661 A1 19961127; EP 0744661 B1 19981007; DE 69600744 D1 19981112; DE 69600744 T2 19990520; JP 3467118 B2 20031117; JP H08320558 A 19961203; KR 100384737 B1 20040616; KR 960042215 A 19961221; US 5667932 A 19970916
DOCDB simple family (application)
EP 96108273 A 19960523; DE 69600744 T 19960523; JP 12519495 A 19950524; KR 19960017782 A 19960523; US 65184996 A 19960521