EP 0750968 B1 20000216 - APPARATUS FOR CONDITIONING A POLISHING PAD
Title (en)
APPARATUS FOR CONDITIONING A POLISHING PAD
Title (de)
VORRICHTUNG ZUM ABRICHTEN EINES POLIERKISSEN
Title (fr)
APPAREIL POUR DRESSER UN PATIN DE POLISSAGE
Publication
Application
Priority
US 56495 P 19950626
Abstract (en)
[origin: EP0750968A1] A conditioning end effector apparatus (10) for conditioning a CMP polish pad (40) includes an end effector (20) for contacting CMP polish pad (40). Holder mechanism (12) includes end effector recess (18) for receiving end effector (20) . Spacer mechanism (22 or 22') is also located at predetermined locations in end effector recess (18) to associate with end effector openings (26) in end effector (20) . End effector (20) firmly attaches through spacer mechanism (22 or 22') to holder mechanism (12) using a fastening device (24). Because of spacer mechanism (22 or 22'), end effector (20) is at distance from recess face (36) to permit slurry (38) that is deposited on CMP polish pad (40) to pass through end effector openings (26). <IMAGE>
IPC 1-7
IPC 8 full level
B24B 37/00 (2006.01); B24B 37/04 (2006.01); B24B 53/007 (2006.01); B24B 53/017 (2012.01); H01L 21/304 (2006.01)
CPC (source: EP KR)
B24B 53/017 (2013.01 - EP); H01L 21/304 (2013.01 - KR)
Designated contracting state (EPC)
DE FR GB IT NL
DOCDB simple family (publication)
EP 0750968 A1 19970102; EP 0750968 B1 20000216; DE 69606669 D1 20000323; DE 69606669 T2 20000817; JP H0911120 A 19970114; KR 970003594 A 19970128
DOCDB simple family (application)
EP 96304660 A 19960625; DE 69606669 T 19960625; JP 16279796 A 19960624; KR 19960023455 A 19960625